2014
DOI: 10.1134/s0021364014090124
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Study of the structural and magnetic characteristics of epitaxial Fe3Si/Si(111) films

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Cited by 28 publications
(18 citation statements)
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“…The coercive force measured for Fe 3 Si slightly exceeds the values obtained by other authors [7,28], including those for films on GaAs(001) and Ge(111) substrates [29,30]. The coercive force for the Fe 5 Si 3 film is close to values measured for Fe 3 Si, but it is half as large as the value obtained for the polycrystalline Fe 5 Si 3 film with a thickness 65 nm from [10] and slightly exceeds the value of H c for a Fe 5 Si 3 nanofila ment at room temperature [31].…”
Section: Resultscontrasting
confidence: 68%
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“…The coercive force measured for Fe 3 Si slightly exceeds the values obtained by other authors [7,28], including those for films on GaAs(001) and Ge(111) substrates [29,30]. The coercive force for the Fe 5 Si 3 film is close to values measured for Fe 3 Si, but it is half as large as the value obtained for the polycrystalline Fe 5 Si 3 film with a thickness 65 nm from [10] and slightly exceeds the value of H c for a Fe 5 Si 3 nanofila ment at room temperature [31].…”
Section: Resultscontrasting
confidence: 68%
“…The SiO 2 layer with a thickness of about 13.6 nm was formed by thermal oxidation of the Si(100) substrate in an O 2 + HCl medium at a temperature of 1000°C. After oxida tion, the substrate was degreased according to the method proposed in [7], placed in an ultrahigh vac uum, and then annealed at 250°C.…”
Section: Analysis Of Optical and Magnetooptical Spectra Of Fe 5 Si 3 mentioning
confidence: 99%
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“…The formation of the film structure was controlled by an LEF 751M high speed laser ellipsometer [10]. The technique used for the preparation of the atomically clean Si(111)7 × 7 surface, the process of growth of Fe 3 Si/Si(111)7 × 7 film, and the data on the structure of this film and its magnetic properties were described in [11].…”
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confidence: 99%