2001
DOI: 10.1116/1.1415510
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Study of the resist deformation in nanoimprint lithography

Abstract: Numerical simulations and experimental studies are carried out to understand the deformation process of thin polymer film in nanoimprint lithography. Deformation of a thin polymer above its glass transition temperature is studied for various imprinting conditions such as the aspect ratios of a mold pattern, initial thickness of the polymer, and imprinting pressure. Cross-sectional profiles of the deformed polymers are simulated by the finite element method based on a rubber elastic model. The results are compa… Show more

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Cited by 141 publications
(90 citation statements)
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“…Simulations that excluded surface tension examined embossing of 200 nm thick polymer films and produced single peak deformation for W/h i < 1 and dual peak deformation for W/h i > 1 [9]. The Newtonian liquid deformations presented here agree with nonlinear solid elastic deformations [10,11] that also noted cavity geometry and initial film thickness modulate deformation mode.…”
Section: Discussionsupporting
confidence: 72%
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“…Simulations that excluded surface tension examined embossing of 200 nm thick polymer films and produced single peak deformation for W/h i < 1 and dual peak deformation for W/h i > 1 [9]. The Newtonian liquid deformations presented here agree with nonlinear solid elastic deformations [10,11] that also noted cavity geometry and initial film thickness modulate deformation mode.…”
Section: Discussionsupporting
confidence: 72%
“…When surface tension effects were removed from the simulations, smooth single or dual peaks were observed dependent on cavity width, as observed in viscous flow experiments [6]. Other simulations and experiments [10,11] investigated purely nanometer scale geometries and film thicknesses. Elastic solid simulations modeled the polymer with the nonlinear stressstrain behavior of a Moony-Rivlin material.…”
Section: Introductionmentioning
confidence: 75%
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