Study of the perpendicular self-assembly of a novel high-<i>χ</i> block copolymer without any neutral layer on a silicon substrate

Zhang, Baolin; Liu, Weichen; Meng, Lingkuan; Zhang, Zhengping; Wu, Xing; Dai, Jun Yan; Mao, Guoyong; Wei, Yayi

doi:10.1039/c8ra10319d

Cited by 3 publications

(2 citation statements)

References 42 publications

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“…In general, lithography requires BCPs with a high χ parameter, high etching contrast, and orientation control. 1,2 Among all reported BCP materials, silicon-based ones are advantageous due to their high χ parameter and etching contrast. The high χ parameter enables minimization of both the self-assembled periodic nanostructure and the interfacial roughness.…”

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confidence: 99%

An experimental and theoretical investigation into the self-assembly of a chemically modified high-χ coil–rod diblock copolymer

et al. 2022

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Section: Introductionmentioning

confidence: 99%

An experimental and theoretical investigation into the self-assembly of a chemically modified high-χ coil–rod diblock copolymer

et al. 2022

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“…In our experiment, a new material polystyrene-b-polycarbonate (PS-b-PC) is used, which not only has a small molecular weight, but also has a high χ value of 0.19. [42] It is shown that by mixing PS-b-PC with PS, the phase state is changed from lammella to cylinder and the pitch is ≈24 nm. [43] However, in this work, it is found that such cylinder phase state is no longer a time-stable state.…”

Section: Introductionmentioning

confidence: 99%

The Phase Aggregation Behavior of the Blend Materials Block Copolymer Polystyrene‐b‐Polycarbonate (PS‐b‐PC) and Homopolymer Polystyrene (PS)

Liu

Zhang

Chen

et al. 2021

Macro Chemistry & Physics

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The ORCID identification number(s) for the author(s) of this article can be found under https://doi.org/10.1002/macp.202000432. that the aggregation behavior is consistent over a wide temperature range from 150 to 200 °C. For the blend material used, when cylinder is formed, the free energy of the system is not stable. Then, keeping the annealing temperature constant and the annealing time increasing, the neighboring cylinders aggregate and form large-diameter cylinders. This dynamic behavior opens a new window of self-assembly applications by obtaining different structures through process control.

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Investigation of Micro-phase Separation of A Novel Block Copolymer Polystyrene-b-Polytrimethylene Carbonate (PS-<i>b</i>-PTMC)

Zhang

Meng

2021

J. Photopol. Sci. Technol.

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As an emerging developing technique for next-generation lithography, from self-assembly to directed self-assembly of block copolymer has attracted numerous attentions and has been a potential alternative to supplement the intrinsic limitations of conventional photolithography. In this work, a novel high-χ block copolymer Polystyrene-b-Polytrimethylene Carbonate (PS-b-PTMC) material has been successfully synthesized. It can be directly coated on Si substrates to form periodic micro-phase separation structures by annealing processes without the use of neutral layer or additional top coat. A unique selfassembly surface defect phenomenon called as black and white spots shows two different colors in SEM view. An in-depth study on the phenomenon has been carried out, including experimental characterization analysis, mechanism exploration, process optimization, etc., to find out the internal mechanism leading to the formation of such defects. It is necessary to balance both polymer/substrate and polymer/the free surface interfaces, which could induce the perpendicular orientation of microdomains. On this basis, the mechanism self-assembly defects has been proposed, and then an effective process scheme to remove the defects without affecting the formation of periodic vertical micro-phase separation patterns has also been provided, which showed a great potential of novel block copolymer under the condition of neutral layer free. We also realized the elimination of black and white spots by optimizing the process condition of BCP self-assembly and directed self-assembly (DSA). Valuable information and insights are provided for nanowire patterning in state-of-the-art semiconductor devices.

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Study of the perpendicular self-assembly of a novel high-χ block copolymer without any neutral layer on a silicon substrate

Abstract: A novel type of high-χ block copolymer, polystyrene-block-polycarbonate (PS-b-PC), which contains an active –NH– group on the polymer backbone between the PS block and the PC block, has been successfully synthesized.

Cited by 3 publications

References 42 publications

An experimental and theoretical investigation into the self-assembly of a chemically modified high-χ coil–rod diblock copolymer

An experimental and theoretical investigation into the self-assembly of a chemically modified high-χ coil–rod diblock copolymer

The Phase Aggregation Behavior of the Blend Materials Block Copolymer Polystyrene‐b‐Polycarbonate (PS‐b‐PC) and Homopolymer Polystyrene (PS)

Investigation of Micro-phase Separation of A Novel Block Copolymer Polystyrene-b-Polytrimethylene Carbonate (PS-<i>b</i>-PTMC)

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