2018
DOI: 10.14257/ijast.2018.115.11
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Study of Silicon Body Thickness and Channel Length on SCEs and Electrical Performances of Underlapped GS-DG-MOSFET

Abstract: In this paper, the investigation is carried out with the variation of silicon body thickness (TSi)

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(4 citation statements)
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“…The DM-GS-DG-FinFET structure is considered with dielectric modulated for biomolecule sensing applications in the nanoscale range. 9,16,37 Further, the dielectric constants κ-values of 1, 2, 5, 7, and 12 and charge densities ρ-values of −1 × 10 10 , −5 × 10 11 , and −1 × 10 12 cm −2 are considered to observe the variations in the band bending at the source-channel junction beneath the cavity region. Figures 4a and 4b show the electric field profile of the device DM-GS-DG-FinFET-based biosensor for different κand ρ-values in the ON-state (V GS = 1.0 V and V DS = 1.0 V)…”
Section: Resultsmentioning
confidence: 99%
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“…The DM-GS-DG-FinFET structure is considered with dielectric modulated for biomolecule sensing applications in the nanoscale range. 9,16,37 Further, the dielectric constants κ-values of 1, 2, 5, 7, and 12 and charge densities ρ-values of −1 × 10 10 , −5 × 10 11 , and −1 × 10 12 cm −2 are considered to observe the variations in the band bending at the source-channel junction beneath the cavity region. Figures 4a and 4b show the electric field profile of the device DM-GS-DG-FinFET-based biosensor for different κand ρ-values in the ON-state (V GS = 1.0 V and V DS = 1.0 V)…”
Section: Resultsmentioning
confidence: 99%
“…A gate-stacking structure is preferred to improve the I ON and to obtain a steeper SS. 16,19,20 Among the reported designs, the gate stack offers better immunity toward the interface trap charges and minimum SS. 21,22 The SM-GS-DG 23,24 has been previously studied in the literature, but the underlap region in the structure provides more electrostatic influence over the channel area, improving I ON .…”
Section: Device Description and Simulation Platformmentioning
confidence: 99%
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