2015
DOI: 10.4028/www.scientific.net/msf.821-823.137
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Study of SiC Epitaxial Growth Using Tetrafluorosilane and Dichlorosilane in Vertical Hotwall CVD Furnace

Abstract: This paper presents one of the first comparative studies of distinctive results obtained using halogenated silicon precursors, dichlorosilane (SiH2Cl2, DCS) and tetrafluorosilane (SiF4, TFS) for SiC homo epitaxial growth. Both TFS and DCS possess very distinct properties that show specific influence on SiC growth. SiC epitaxial growth using TFS greatly suppresses parasitic deposition in the gas delivery system. Growth using TFS shows carbon mediated growth regime, and exhibits controlled doping concentration o… Show more

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Cited by 3 publications
(2 citation statements)
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“…The device structure (Figure a) starts with EG/SiC Schottky diodes created by growing a homoepitaxial layer of n-type 4H-SiC, unintentionally doped to 1.6 × 10 14 cm –3 on a n + -SiC substrate by chemical vapor deposition (CVD) in a hot wall reactor with SiF 4 and propane precursors in a hydrogen atmosphere, as described elsewhere. Graphene was then formed natively on the previous homoepitaxial layer through exposure to SiF 4 in an Ar atmosphere . EG showed the key Raman peaks at ∼1580, ∼1350, and ∼2650 cm –1 with a D/G ratio of ∼0.1, indicating good quality.…”
Section: Methodsmentioning
confidence: 99%
“…The device structure (Figure a) starts with EG/SiC Schottky diodes created by growing a homoepitaxial layer of n-type 4H-SiC, unintentionally doped to 1.6 × 10 14 cm –3 on a n + -SiC substrate by chemical vapor deposition (CVD) in a hot wall reactor with SiF 4 and propane precursors in a hydrogen atmosphere, as described elsewhere. Graphene was then formed natively on the previous homoepitaxial layer through exposure to SiF 4 in an Ar atmosphere . EG showed the key Raman peaks at ∼1580, ∼1350, and ∼2650 cm –1 with a D/G ratio of ∼0.1, indicating good quality.…”
Section: Methodsmentioning
confidence: 99%
“…Thus the surfaces of polypropylene and other materials used for PPEs can be easily oxidized by a simple plasma treatment [45,46] and modified with hybrid SAMs. The selfassembly can be formed by a simple dip coating or a chemical vapour deposition [29,[47][48][49]. In another study, polypropylene (PP) and polytetrafluoroethylene (PTFE) films were functionalized by amine groups in two steps; first grafting of acryloyl chloride (AC) using γ-rays and then chemical coupling between the grafted AC and ethylenediamine (ED) as shown in Figure 4(b) [50,51].…”
Section: Strategies Of the Surface Engineering/ Modificationmentioning
confidence: 99%