Study of plasma immersion ion implantation inside a conducting tube using an E×B field configuration

Pillaca, Elver Juan de Dios Mitma; Ueda, M.; Mariano, Samantha de Fátima Magalhães; Oliveira, R. M.

doi:10.1016/j.surfcoat.2014.03.042

Cited by 7 publications

(4 citation statements)

References 9 publications

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“…For case B treatment, since there are no parts sticking out the tube but only flat supports with samples inside it, less problems with arcing were expected, based on our previous results. 20 In fact, the experiment progressed smoothly and the samples were treated for 2 h after a surface cleaning with argon bombardment (10 min cleaning). The surfaces of the samples exposed to nitrogen bombardment were analyzed with different techniques as discussed above.…”

Section: Proof Of Principle Experiments and Resultsmentioning

confidence: 99%

“…18,19 In particular, PIII with the magnetic field for the treatment of the internal parts of tubes of medium size radius (2-5.5 cm) and length (15-20 cm) with nitrogen implantation was demonstrated recently. 20 So, by combining these two ideas, (1) metal tubular geometry fixture and (2) high density hollow cathode-like plasmas produced inside a tube by negative high voltage pulses, either with or without magnetic fields, we were able to develop PIII and PIII and D configurations that are very effective for the simultaneous ion implantation of many industrial workpieces in the batch mode, for the surface finishing of industrial components in the final form.…”

Section: Introductionmentioning

confidence: 99%

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New method of plasma immersion ion implantation and also deposition of industrial components using tubular fixture and plasma generated inside the tube by high voltage pulses

Ueda

Silva

Pillaca

et al. 2016

Review of Scientific Instruments

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A new method of Plasma Immersion Ion Implantation (PIII) and deposition (PIII and D) for treating industrial components in the batch mode has been developed. A metal tubular fixture is used to allocate the components inside, around, and along the tube, exposing only the parts of each component that are to be ion implanted to the plasma. Hollow cathode-like plasma is generated only inside the tube filled with the desired gas, by applying high negative voltage pulses to the hollow cylindrical fixture which is insulated from the vacuum chamber walls. This is a very convenient method of batch processing of industrial parts by ion implantation, in which a large number of small to medium sized components can be treated by PIII and PIII and D, very quickly, efficiently, and also at low cost.

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Section: Proof Of Principle Experiments and Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

New method of plasma immersion ion implantation and also deposition of industrial components using tubular fixture and plasma generated inside the tube by high voltage pulses

Ueda

Silva

Pillaca

et al. 2016

Review of Scientific Instruments

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“…This system is described in detail elsewhere [14]. Inside the chamber, metallic tubes of length 150 mm and diameters of 110 mm, 40 mm and 15 mm were placed on the axis to coincide with the region where the magnetic field has its minimum value.…”

Section: Methodsmentioning

confidence: 99%

“…Recently, interest has arisen in the possibility of using a magnetic field to enhance the PIII process for the treatment of tubes made of stainless steel [12,13]. The principal advantage of this approach is related to promoting an electric discharge at low gas pressure [14]. This is possible owing to the presence of a magnetic field transversal to the electric field.…”

Section: Plasma Immersion Ion Implantation (Piii) Is a Widely Used Technique For Thementioning

confidence: 99%

X-Ray Photoelectron Spectroscopy (Xps) Study of Conductive Tube After Nitrogen Piii

Santos¹,

Pillaca²,

Ueda³

et al. 2021

The Great World of Nanotechnology Vol II

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O conteúdo deste livro está licenciado sob uma Licença de Atribuição Creative Commons Atribuição-Não-Comercial NãoDerivativos 4.0 Internacional (CC BY-NC-ND 4.0). Direitos para esta edição cedidos à Editora Artemis pelos autores. Permitido o download da obra e o compartilhamento, desde que sejam atribuídos créditos aos autores, e sem a possibilidade de alterá-la de nenhuma forma ou utilizá-la para fins comercial. A responsabilidade pelo conteúdo dos artigos e seus dados, em sua forma, correção e confiabilidade é exclusiva dos autores. A Editora Artemis, em seu compromisso de manter e aperfeiçoar a qualidade e confiabilidade dos trabalhos que publica, conduz a avaliação cega pelos pares de todos manuscritos publicados, com base em critérios de neutralidade e imparcialidade acadêmica.

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Experiments on plasma immersion ion implantation inside conducting tubes embedded in an external magnetic field

Pillaca

Ueda

Reuther

et al. 2015

Applied Surface Science

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Study of plasma immersion ion implantation inside a conducting tube using an E×B field configuration

Cited by 7 publications

References 9 publications

New method of plasma immersion ion implantation and also deposition of industrial components using tubular fixture and plasma generated inside the tube by high voltage pulses

New method of plasma immersion ion implantation and also deposition of industrial components using tubular fixture and plasma generated inside the tube by high voltage pulses

X-Ray Photoelectron Spectroscopy (Xps) Study of Conductive Tube After Nitrogen Piii

Experiments on plasma immersion ion implantation inside conducting tubes embedded in an external magnetic field

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