2018
DOI: 10.1016/j.ijleo.2018.07.112
|View full text |Cite
|
Sign up to set email alerts
|

Study of photoluminescence quenching in porous silicon layers that using for chemical solvents vapor sensor

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

1
6
0

Year Published

2020
2020
2024
2024

Publication Types

Select...
9

Relationship

1
8

Authors

Journals

citations
Cited by 49 publications
(7 citation statements)
references
References 18 publications
1
6
0
Order By: Relevance
“…The effect of changing the etching current densities in making porous silicon was clear on the pore diameter and surface roughness, and this is consistent with the results of the AFM examination, where the pore roughness was equal to (2.44 nm) and the pore diameter was equal to (23.05nm) at J = 12 mA/cm 2 , while at J = 30 mA/cm 2 The surface roughness is (8.63 nm) and the pore diameter is (26.23 nm). This is also consistent with the results of the SEM examination, where the higher the etching current density, the greater the pore diameter, the higher the surface roughness and the smaller the pore wall, and this leads to an increase in the surface area exposed to the gas and an increase in the energy gap on the surface [6,7]. The lowest ethanol gas response was also obtained for Ra / Rg =1.313257 at etching current density of 12 mA / cm 2 .but at ethanol gas the higher sensitivity was (0.380801) at etching current density J=12mA/cm 2 then at J= (24mA/cm 2 ) about Ra / Rg= (0.161195093) and the lowest was at J=30 mA/cm 2 with Ra / Rg= (0.12389692).…”
Section: Resultssupporting
confidence: 90%
See 1 more Smart Citation
“…The effect of changing the etching current densities in making porous silicon was clear on the pore diameter and surface roughness, and this is consistent with the results of the AFM examination, where the pore roughness was equal to (2.44 nm) and the pore diameter was equal to (23.05nm) at J = 12 mA/cm 2 , while at J = 30 mA/cm 2 The surface roughness is (8.63 nm) and the pore diameter is (26.23 nm). This is also consistent with the results of the SEM examination, where the higher the etching current density, the greater the pore diameter, the higher the surface roughness and the smaller the pore wall, and this leads to an increase in the surface area exposed to the gas and an increase in the energy gap on the surface [6,7]. The lowest ethanol gas response was also obtained for Ra / Rg =1.313257 at etching current density of 12 mA / cm 2 .but at ethanol gas the higher sensitivity was (0.380801) at etching current density J=12mA/cm 2 then at J= (24mA/cm 2 ) about Ra / Rg= (0.161195093) and the lowest was at J=30 mA/cm 2 with Ra / Rg= (0.12389692).…”
Section: Resultssupporting
confidence: 90%
“…PSi has a property, namely the ability to adjust porosity, which makes it appropriate for a wide range of gas sensor applications [4]. So it can be used for wide application areas including Light-emitting diode, dielectric waveguides, chemical, and biological sensors, solar cell (antireflection coating), field emission device, and photo-detector [5] Furthermore, PSi is a frequently utilized and intriguing material for its nanostructures [6]. It features a large surface area with a customizable shape and strong light interaction.…”
Section: Introductionmentioning
confidence: 99%
“…These results indicated that the PL quenching depended on not only the vapor pressure of the analytes, but also the functionalities of organic molecules. Additionally, Nayef et al reported [ 22 ] that PL quenching is related to the dipole moment of organic molecules. This finding can be interpreted as being due to the stabilization of the PSi surface trap by the alignment of the dipoles of the organic molecules.…”
Section: Resultsmentioning
confidence: 99%
“…The final products were deposited on the glass substrates by chemical spray pyrolysis at 300 • C and an atmospheric pressure of 7.5 bar lasting 5 seconds as the Figure1b. The reaction was investigated by the following equation [19]: 3b. In addition, the porous silicon peak is shifting slightly to small diffraction angle with increasing concentration.…”
Section: Synthesis and Deposition Of Znsmentioning
confidence: 99%