Abstract:Changes of microstructure, phase composition and surface morphology were investigated for 200-700 nm thick Ti films, which were deposited on Si substrates using magnetron sputtering technique and treated at pressure of 5-10 Pa by water vapor plasma with the plasma processing power in the range of 20-300 W. Depth profiling of oxygen and hydrogen atoms across the thickness of plasma treated Ti films, surface height nanotopography and four-point probe resistivity measurements have been performed complementary to … Show more
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