Abstract:In recent years, we have seen growing numbers of reports on problems associated with outgas generated from resists during ArF exposure, including contaminating of the exposure equipment lens. Scanner manufacturers have apparently begun taking countermeasuresfor example, establishing criteria for outgas generated by resists during exposure. In the near future, resist manufacturers will likely be required to attach documents regarding outgassing to their products at the time of shipment. In our earlier studies, … Show more
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