2007
DOI: 10.1016/j.jcrysgro.2006.11.241
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Study of optical properties of GaAsN layers prepared by molecular beam epitaxy

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Cited by 10 publications
(4 citation statements)
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“…Under suitable growth conditions, we achieved the formation of a GaAs nano grooved surface with a high degree of lateral periodicity. 7) The lateral periodicity of the nanoscale step arrays and the step height are about 60 and 1.5 nm, respectively, and are oriented along the ½ " 113 direction, as observed in Fig. 1(a).…”
Section: Resultsmentioning
confidence: 81%
“…Under suitable growth conditions, we achieved the formation of a GaAs nano grooved surface with a high degree of lateral periodicity. 7) The lateral periodicity of the nanoscale step arrays and the step height are about 60 and 1.5 nm, respectively, and are oriented along the ½ " 113 direction, as observed in Fig. 1(a).…”
Section: Resultsmentioning
confidence: 81%
“…This temperature was employed in order to incorporate a low nitrogen content into the InAs SAQDs [A. Pulzara-Mora et al, 2007]. The RHEED intensity variation of the transmission spot for sample M4 (Fig.…”
Section: Rheed Patternmentioning
confidence: 99%
“…In previous works, spectroscopic ellipsometry (SE) was used for the GaAsN material to investigate the nitrogen effect on GaAs host matrix [10], [11]. Very recently, Pulzara-Mora et al [12] studied the growth temperature (from 420 to 600 • C) effect of GaAsN on GaAs substrate by photoreflectance (PR) spectroscopy and phase modulated ellipsometry (PME), and established the corresponding growth mode. In a previous work [12], we have reported results relative to RTA effect on the GaAs 1−x N x : the accurate optical constants, and the decrease of the E 1 transition energy nitrogen dependence.…”
Section: Introductionmentioning
confidence: 99%
“…Very recently, Pulzara-Mora et al [12] studied the growth temperature (from 420 to 600 • C) effect of GaAsN on GaAs substrate by photoreflectance (PR) spectroscopy and phase modulated ellipsometry (PME), and established the corresponding growth mode. In a previous work [12], we have reported results relative to RTA effect on the GaAs 1−x N x : the accurate optical constants, and the decrease of the E 1 transition energy nitrogen dependence. In this work, we study the rapid thermal annealing effect using room temperature spectroscopic ellipsometry technique on GaAs 1−x N x (x = 0.1%, 0.5% and 1.5%) layers grown by molecular beam epitaxy (MBE) on GaAs substrate.…”
Section: Introductionmentioning
confidence: 99%