Study of NbGeSi films deposited by chemical vapour deposition

Païdassi, S.; Spitz, J.; Besson, Jean

doi:10.1016/0040-6090(79)90101-9

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Cited by 6 publications

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“…19,20) The Nb/Si atomic ratio is close to Nb 3 Si 2 , which was reported as a phase different from Nb 5 Si 3 . 21,22) Nb 3 Si 2 is considered to be one of metastable phases in the Nb-Si system formed usually due to impurity contamination.…”

Section: Resultsmentioning

confidence: 99%

Effect of Copper Addition on the Niobium Disilicide Coatings by Pack Cementation

Song

et al. 2004

Mater. Trans.

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NbSi 2 coatings were deposited on pure niobium by halide-activated pack cementation method. The effect of copper addition in pack mixture on the siliconizing process was investigated. After siliconizing on niobium at 1050 C for 2 h using a pack mixture composed of Si, NaF and SiC, a single phase of hexagonal NbSi 2 coating was formed. The addition of copper in pack mixture not only increased the growth rate of the coatings, but also led to form a very thin interlayer between the NbSi 2 coating and the niobium substrate.

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Section: Resultsmentioning

confidence: 99%