2006
DOI: 10.1016/j.tsf.2006.07.034
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Study of metal organic chemical vapor deposition TiN thin films in real structures

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Cited by 2 publications
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“…The (200), (111) and (220) orientations of TiN x films in CVD has been widely obtained [21][22][23][24]. Pangarov [25] proposed a model to explain the preferred orientation.…”
Section: Resultsmentioning
confidence: 99%
“…The (200), (111) and (220) orientations of TiN x films in CVD has been widely obtained [21][22][23][24]. Pangarov [25] proposed a model to explain the preferred orientation.…”
Section: Resultsmentioning
confidence: 99%