2014
DOI: 10.1166/jnn.2014.10142
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Study of Low Resistivity and High Work Function ITO Films Prepared by Oxygen Flow Rates and N<SUB>2</SUB>O Plasma Treatment for Amorphous/Crystalline Silicon Heterojunction Solar Cells

Abstract: Pulsed DC magnetron sputtered indium tin oxide (ITO) films deposited on glass substrates with lowest resistivity of 2.62 x 10(-4) Ω x cm and high transmittance of about 89% in the visible wavelength region. We report the enhancement of ITO work function (Φ(ITO)) by the variation of oxygen (O2) flow rate and N2O surface plasma treatment. The Φ(ITO) increased from 4.43 to 4.56 eV with the increase in O2 flow rate from 0 to 4 sccm while surface treatment of N2O plasma further enhanced the ITO work function to 4.6… Show more

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Cited by 12 publications
(4 citation statements)
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“…The sheet resistance of ITO films gradually decreased from 54 to 26.82 Ω/sq as the working pressure was increased from 0.96 to 0.99 mTorr. The decrease in resistivity of the ITO films is related to the combined influence of the Hall mobility and carrier concentration [14][15][16]. The maximum value of the Hall mobility of ITO films was recorded as 46.89 (cm 2 /V.s) for the working pressure of 0.99 mTorr.…”
Section: Resultsmentioning
confidence: 95%
“…The sheet resistance of ITO films gradually decreased from 54 to 26.82 Ω/sq as the working pressure was increased from 0.96 to 0.99 mTorr. The decrease in resistivity of the ITO films is related to the combined influence of the Hall mobility and carrier concentration [14][15][16]. The maximum value of the Hall mobility of ITO films was recorded as 46.89 (cm 2 /V.s) for the working pressure of 0.99 mTorr.…”
Section: Resultsmentioning
confidence: 95%
“…In addition, the interfacial electric field can reduce the work function of ITO, which would favor light‐generated electron extraction. [ 34,35 ] To further explore the ITO work function versus device performance, a simulated work was conducted. As shown in Figure S9, Supporting Information, the calculated results indicate that the performance of devices improved with a decreased work function of the front ITO.…”
Section: Resultsmentioning
confidence: 99%
“…The highest cell parameters in this report are Jsc = 34.79 mA·cm−2, Voc = 714 mV and η = 17.82. However, the device performance is reduced when [Oi] concentration exceeds the limit from 3.2 × 10 20 cm −3 [ 91 ]. One of the most important facts of the work function of TCO thin layers creates the band bending effect in TCO/a-Si:H(p) interface [ 92 ].…”
Section: Current Challenges and Future Outlookmentioning
confidence: 99%
“…Additionally, graphene material has huge potential for the development of TCO materials because of its excellent light transmittance and high electrical conductivity [ 88 ]. Table 2 provides a list of TCO films and deposition techniques with the films’ parameters, properties, and efficiency, respectively [ 31 , 32 , 33 , 34 , 36 , 38 , 53 , 78 , 91 , 93 , 94 , 95 , 97 , 98 ]. In terms of outlook, the development of high-performance and low-cost TCO materials is crucial for the commercialization of SHJ solar cells and other high-efficiency solar cell technologies.…”
Section: Current Challenges and Future Outlookmentioning
confidence: 99%