Study of iodine atom production in Ar/CH<sub>3</sub>I dc glow discharges

Dem'yanov, A.V.; Кочетов, И. В.; Napartovich, A. P.; Azyazov, Valeriy N.; Mikheyev, P. A.

doi:10.1088/0963-0252/19/2/025017

Cited by 12 publications

(12 citation statements)

References 32 publications

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“…Recombination of iodine atoms with methyl radicals I + CH 3 → CH 3 I is the main process of iodine atoms' loss [12] that leads to an increase of specific energy per produced iodine atom. Therefore, it is reasonable to assume that the addition of a species reacting with a methyl radical may shift the chemical equilibrium and make iodine atom production more efficient.…”

Section: Plasma Sources Science and Technologymentioning

confidence: 99%

“…In our previous work a transverse flow dc glow discharge in Ar : CH 3 I mixtures was modeled using a plug-flow approximation and plasma evolution was computed within a frame of reference moving with the gas [12]. Kinetic equations in [12] for electrons, ions and neutrals were solved together with the Boltzmann equation in two-term approx imation for the quasi-steady electron energy distribution function (EEDF). In the solution of the Boltzmann equation, electronelectron, elastic, inelastic and superelastic collisions (with excited species) are taken into account so that the model is fully self-consistent.…”

Section: Model Descriptionmentioning

confidence: 99%

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Influence of molecular oxygen on iodine atoms production in an RF discharge

Mikheyev

Ufimtsev

Dem'yanov

et al. 2016

Plasma Sources Sci. Technol.

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The results of the experiments and modeling of CH 3 I dissociation in a 40 MHz RF discharge plasma are presented. A discharge chamber of an original design, consisting of quartz tubes between two planar electrodes, permitted us to produce iodine atoms with a number density up to 2 × 10 16 cm −3 . In this discharge chamber, contrary to the previous experiments with a DC discharge and RF discharge with bare planar electrodes, contamination of the walls of the tubes did not disturb discharge stability, thus increasing iodine production rate.

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Section: Plasma Sources Science and Technologymentioning

confidence: 99%

Section: Model Descriptionmentioning

confidence: 99%

Influence of molecular oxygen on iodine atoms production in an RF discharge

Mikheyev

Ufimtsev

Dem'yanov

et al. 2016

Plasma Sources Sci. Technol.

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“…Since first experiments using the pulsed discharge in the O 2 -CF 3 I mixture [5], a thorough investigation of this system brought many new findings about relevant kinetics problems [6]. Quite recently, another production mechanism involving excited rare-gas atoms was pointed out in case of CH 3 I [7,8]:…”

Section: (2)mentioning

confidence: 99%

Production of iodine atoms by RF discharge decomposition of CF₃I

Jirásek¹,

Schmiedberger²,

Čenský³

et al. 2011

J. Phys. D: Appl. Phys.

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A generation of atomic iodine by dissociation of CF 3 I in RF discharge was studied experimentally in a configuration ready for direct use of the method in the oxygen-iodine laser. The discharge was ignited between the coaxial electrodes with a radial distance of 3.5 mm in a flowing mixture of 0.1-0.9 mmol.s -1 of CF 3 I and 0.5-6 mmol.s -1 of buffer gas (Ar, He) at a pressure of 2-3 kPa. The discharge stability was improved by different approaches so that the discharge could be operated up to a RF source limit of 500 W without sparking. The gas leaving the discharge was injected to the subsonic or supersonic flow of N 2 and concentration of generated atomic iodine and gas temperature were measured downstream of the injection. An inhomogeneous distribution of the produced iodine atoms among the injector exit holes was observed, which was attributed to a different gas residence time corresponding to each hole. The dissociation fraction was better with pure argon as a diluting gas than in the mixture of Ar-He, although the variation in the Ar flow rate had no significant effect on the CF 3 I dissociation. The dissociation fraction calculated from the atomic iodine concentration measured several centimeters downstream of the injection was in the range of 7 to 30% when the absorbed electric energy ranged from 200 to 4000 J per 1 mmol of CF 3 I. Corresponding values of the fraction of power spent on the dissociation decreased from 8 to 2%.% and the energy cost for one iodine atom increased from 30 to 130 eV. Due to a possible high rate of the atomic iodine loss by recombination after leaving the discharge, these values are considered as lower limits of those achieved in the discharge.

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“…Electric-discharge [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] and chemical [18][19][20] generators have been proposed as a source of iodine atoms for the use in OIL. Dissociation of iodine-containing molecules in electric-discharge plasmas had been proved to be useful for external production of iodine atoms.…”

Section: Introductionmentioning

confidence: 99%

Heterogeneous losses of externally generated I atoms for OIL

Torbin

Mikheyev

Ufimtsev

et al. 2013

XIX International Symposium on High-Power Laser Systems and Applications 2012

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Usage of an external iodine atom generator can improve energy efficiency of the oxygen-iodine laser (OIL) and expand its range of operation parameters. However, a noticeable part of iodine atoms may recombine or undergo chemical bonding during transportation from the generator to the injection point. Experimental results reported in this paper showed that uncoated aluminum surfaces readily bounded iodine atoms, while nickel, stainless steel, Teflon or Plexiglas did not. Estimations based on experimental results had shown that the upper bound of probability of surface iodine atom recombination for materials Teflon, Plexiglas, nickel or stainless steel is γ rec ≤ 10 -5 .

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Study of iodine atom production in Ar/CH₃I dc glow discharges

Cited by 12 publications

References 32 publications

Influence of molecular oxygen on iodine atoms production in an RF discharge

Influence of molecular oxygen on iodine atoms production in an RF discharge

Production of iodine atoms by RF discharge decomposition of CF₃I

Heterogeneous losses of externally generated I atoms for OIL

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Study of iodine atom production in Ar/CH3I dc glow discharges

Cited by 12 publications

References 32 publications

Influence of molecular oxygen on iodine atoms production in an RF discharge

Influence of molecular oxygen on iodine atoms production in an RF discharge

Production of iodine atoms by RF discharge decomposition of CF3I

Heterogeneous losses of externally generated I atoms for OIL

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Product

Resources

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Study of iodine atom production in Ar/CH₃I dc glow discharges

Production of iodine atoms by RF discharge decomposition of CF₃I