The p–n junctions are the building blocks of nowadays
electronic
devices. The n- or p-type conductivity is obtained in classic semiconductors,
like Si, by doping with atoms acting as donors or acceptors, respectively.
Doping was used in ferroelectrics to influence the transition temperature,
magnitude of some physical properties, but not necessarily conduction
type. Therefore, comprehensive studies to obtain true ferroelectric
p–n junctions by controlled doping are missing. Recently, it
has been shown that Pb(Zr0.2Ti0.8)O3 films doped with ≈1% atomic Nb (n-type doping) or Fe (p-type
doping) have different orientations of polarization in the as-grown
state. Knowing that polarization orientation depends on doping type,
the next step is to build ferroelectric p–n homojunctions and
to study their properties in relation to ferroelectric polarization.
p–n and n–p structures were grown for this purpose by
successive deposition of Nb-doped and Fe-doped Pb(Zr,Ti)O3 layers with different thicknesses. We find that these p–n
homojunctions are ferroelectric, but the magnitude of the polarization
and coercive field, as well as the dominant polarization orientation
in the as-grown state, depend on the conduction type of the first
grown layer. The I–V characteristics
are quasi-linear, although the interfaces with the electrodes behaves
as Schottky contacts. The resistance extracted from the I–V characteristics displays an exponential
dependence on temperature, with an activation energy in the range
of 0.14–0.17 eV. These results are explained assuming that
the total current in the junction is the total of electron and hole
injections at the electrode interfaces. It is shown that for relatively
low doping concentrations, the current density contains a dominant
term with a linear voltage dependence and an exponential temperature
dependence, as observed experimentally, and a secondary (correction)
term that is dependent on the free carrier density and can induce
non-linear voltage dependence when this density is significant.