Study of EUV outgassing spatial distribution toward witness plate in the EUV outgas tester

Recent Progress of EUV Resist Technology in EIDEC

“…The EB-based evaluation tool, EUVOM-9000 (Litho Tech Japan Co.), is located at Tsukuba Japan. The EUV-based tool is set up at the beamline 9 of NewSUBARU which is the synchrotron radiation facility of the University of Hyogo [7][8][9][10][11][12][13]. The resist thicknesses were 60 nm.…”

Recent Progress of EUV Resist Technology in EIDEC

“…The EB-based evaluation tool, EUVOM-9000 (Litho Tech Japan Co.), is located at Tsukuba Japan. The EUV-based tool is set up at the beamline 9 of NewSUBARU which is the synchrotron radiation facility of the University of Hyogo [7][8][9][10][11][12][13]. The resist thicknesses were 60 nm.…”

EUV resist outgassing analysis for the new platform resists at EIDEC

“…The EUV type tester named HERC was developed for basic outgassing research and not for the resist qualification inorder to avoid the exposure in the scanner. Previous studies reported fundamental research results of the resist outgassing from the CAR by using the model resists available to-date [9,10]. Resist outgas test sites including the EIDEC continued the evaluation of many commercially available EUV resists.…”

Contribution of EUV resist components to the non-cleanable contaminations

“…In our previous study, we compared the cleanable contamination of several model resists that showed a linear correlation between EUV-and EB-based evaluation systems [2]. Moreover, we studied noncleanable contamination on the unexposed area and clarified its dependency on the geometry of the WS in the vacuum chamber [3][4][5][6]. Moreover the comparison of the cleanable and noncleanable contamination in the resist family, which consisted of the same components with various protecting ratios and PAG loading, showed a good correlation [7,8].…”

Recent Progress of EUV Resist Technology in EIDEC

“…The EB-based evaluation tool, EUVOM-9000 (Litho Tech Japan Co.), is located at Tsukuba Japan. The EUV-based tool is set up at the beamline 9 of NewSUBARU which is the synchrotron radiation facility of the University of Hyogo [7][8][9][10][11][12][13]. The resist thicknesses were 60 nm.…”

EUV resist outgassing analysis for the new platform resists at EIDEC

“…The EUV type tester named HERC was developed for basic outgassing research and not for the resist qualification inorder to avoid the exposure in the scanner. Previous studies reported fundamental research results of the resist outgassing from the CAR by using the model resists available to-date [9,10]. Resist outgas test sites including the EIDEC continued the evaluation of many commercially available EUV resists.…”

Contribution of EUV resist components to the non-cleanable contaminations

“…In our previous study, we compared the cleanable contamination of several model resists that showed a linear correlation between EUV-and EB-based evaluation systems [2]. Moreover, we studied noncleanable contamination on the unexposed area and clarified its dependency on the geometry of the WS in the vacuum chamber [3][4][5][6]. Moreover the comparison of the cleanable and noncleanable contamination in the resist family, which consisted of the same components with various protecting ratios and PAG loading, showed a good correlation [7,8].…”

Recent Progress of EUV Resist Technology in EIDEC

“…The EB-based evaluation tool, EUVOM-9000 (Litho Tech Japan Co.), is located at Tsukuba Japan. The EUV-based tool is set up at the beamline 9 of NewSUBARU which is the synchrotron radiation facility of the University of Hyogo [7][8][9][10][11][12][13]. The resist thicknesses were 60 nm.…”

EUV resist outgassing analysis for the new platform resists at EIDEC

“…The EUV type tester named HERC was developed for basic outgassing research and not for the resist qualification inorder to avoid the exposure in the scanner. Previous studies reported fundamental research results of the resist outgassing from the CAR by using the model resists available to-date [9,10]. Resist outgas test sites including the EIDEC continued the evaluation of many commercially available EUV resists.…”

Contribution of EUV resist components to the non-cleanable contaminations

“…In our previous study, we compared the cleanable contamination of several model resists that showed a linear correlation between EUV-and EB-based evaluation systems [2]. Moreover, we studied noncleanable contamination on the unexposed area and clarified its dependency on the geometry of the WS in the vacuum chamber [3][4][5][6]. Moreover the comparison of the cleanable and noncleanable contamination in the resist family, which consisted of the same components with various protecting ratios and PAG loading, showed a good correlation [7,8].…”