2015
DOI: 10.1007/s13391-015-5108-8
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Study of electrospray assisted electrophoretic deposition of carbon nanotubes on insulator substrates

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Cited by 10 publications
(2 citation statements)
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“…Du et al also seem to have encountered the pore problem of the oxide-covered current collector and tried to achieve better performance by pre-coating nickel as a current collector with CNTs [15]. Kanakamedala et al [16] used an electrospray process to produce a seed layer of CNT on an isolated substrate. Inspired by the literature, a thin and simple carbon coating, but not consisting of CNTs, on the aluminium foil is investigated in the presented work.…”
Section: Introductionmentioning
confidence: 99%
“…Du et al also seem to have encountered the pore problem of the oxide-covered current collector and tried to achieve better performance by pre-coating nickel as a current collector with CNTs [15]. Kanakamedala et al [16] used an electrospray process to produce a seed layer of CNT on an isolated substrate. Inspired by the literature, a thin and simple carbon coating, but not consisting of CNTs, on the aluminium foil is investigated in the presented work.…”
Section: Introductionmentioning
confidence: 99%
“…In our previous work, our group has worked to develop a reproducible and scalable (ie, for large area substrates) method of depositing CNT thin film coatings amenable to a variety of substrate species. Thus far, using substrates ranging from patterned metal (aluminum patterned hydrophilic silicon substrates) through functionalized semiconductors (3‐aminopropyl‐triethoxysilane [APTES] functionalized silicon) and insulators (glass), we have been able to successfully deposit CNT films using techniques involving electrospraying and electrophoretic deposition (EPD) 24‐26 . Despite the formation of good quality films, a limiting factor in this earlier work was the necessity of preprocessing steps as described by the very aforementioned coating methods themselves, that is—thermal evaporation of a thin Al film onto the bare silicon, APTES treatment of bare silicon substrates, and an electro‐sprayed conductive CNT thin film (~100 nm) during the electrophoresis process.…”
Section: Introductionmentioning
confidence: 99%