“…The TAS materials have prepared by different methods such vacuum evaporation process, thermal evaporation, electro-pyroelectric technique, pulsed laser deposition, electron beam, among others (Abdelkader et al, 2016Mellouki et al, 2018;Jebali et al, Chalapathi et al, 2018;Dittrich et al, 2009;Bennaji, et al 2019, Gassoumi et al, 2015. However, chemical bath deposition is simple method widely used to obtain semiconductor thin films on substrates due to some advantages, such as large deposition area, reproducibility, low cost equipment and law temperature processes (Lee et al, 2008 andHodes, 2003 and2007).…”