2018
DOI: 10.1134/s1063782618070242
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Study of Current Flow Mechanisms in a CdS/por-Si/p-Si Heterostructure

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Cited by 2 publications
(2 citation statements)
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“…Porous silicon consists of a network of nanoscale sized silicon wires and voids which formed when crystalline silicon wafers are etched electrochemically in hydrofluoric acid based electrolyte solution under constant anodization conditions. The precise control of porosity and thickness allows the tailoring of optical properties of porous silicon and has opened the door to a multitude of applications in optoelectronics technology [10][11][12]. Such structures consist of silicon particles in several nanometer size separated by voids.…”
Section: Introductionmentioning
confidence: 99%
“…Porous silicon consists of a network of nanoscale sized silicon wires and voids which formed when crystalline silicon wafers are etched electrochemically in hydrofluoric acid based electrolyte solution under constant anodization conditions. The precise control of porosity and thickness allows the tailoring of optical properties of porous silicon and has opened the door to a multitude of applications in optoelectronics technology [10][11][12]. Such structures consist of silicon particles in several nanometer size separated by voids.…”
Section: Introductionmentioning
confidence: 99%
“…Figure 1, a presents the static CVC of the studied EuGa 2 S 4 :Er 3+ crystal measured at room temperature. The following regions may be identified in this CVC: an Ohmic region, which extends up to a voltage of ∼ 800 V; a nonlinear region in the 800−1150 V interval; and a region of steep current rise that ends with breakdown at ∼ 1300 V. The passage of current in semiconductors in the nonlinear CVC region may be attributed to carrier injection from metal electrodes into a semiconductor in relatively weak electric fields and to field ionization of impurity trapping centers (or injection and field ionization acting simultaneously) in strong fields [8].…”
mentioning
confidence: 99%