Study of corrosion behaviour of Ti-coated AISI 316L stainless steel in a simulated body fluid solution

Hellal, Fatah; Atmani, Fouad; Malki, B.; Sedjal, Hamid; Kerkar, M.; Dalard, F.

doi:10.1016/b978-044452224-5/50059-7

Cited by 2 publications

(3 citation statements)

References 6 publications

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“…This function defines the manner of the height's variations of the correlation property of surface heights at two positions that are R points away along the rough surfaces. The normalized correlation function is well-defined by Equation (2).…”

Section: Monofractal Analysis Of Roughness Based On Statistical Prope...mentioning

confidence: 99%

“…A typical tantalum's (Ta) core properties include a high melting point, strong electrical conductivity, high ductility, and corrosion resistance, making it suitable for sophisticated technical applications [1] such as its use in improving surface substrate performance. Ion implantations and ion coatings [2] are two important techniques that have recently gained prominence due to their applications in enhancing the tantalum's corrosive resistivity in extreme industrial mechanisms [3]. It is possible to utilize either or all of the following elements: nitrogen, carbon, oxygen, and argon for ion implantations to tantalum [4] using the ion bombardment process, in which the ion energy, irradiation time, temperature, and density of current distress are the paramount parameters in determining the surface resilience [5,6].…”

Section: Introductionmentioning

confidence: 99%

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Microstructural and Energy-Dispersive X-ray Analyses on Argon Ion Implantations in Tantalum Thin Films for Microelectronic Substrates

et al. 2021

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In the present study, the microstructural and statistical properties of unimplanted in comparison to argon ion-implanted tantalum-based thin film surface structures are investigated for potential application in microelectronic thin film substrates. In the study, the argon ions were implanted at the energy of 30 keV and the doses of 1 × 1017, 3 × 1017, and 7 × 1017 (ion/cm2) at an ambient temperature. Two primary goals have been pursued in this study. First, by using atomic force microscopy (AFM) analysis, the roughness of samples, before and after implantation, has been studied. The corrosion apparatus wear has been used to compare resistance against tantalum corrosion for all samples. The results show an increase in resistance against tantalum corrosion after the argon ion implantation process. After the corrosion test, scanning electron microscopy (SEM) analysis was applied to study the sample morphology. The elemental composition of the samples was characterized by using energy-dispersive X-ray (EDX) analysis. Second, the statisticalcharacteristics of both unimplanted and implanted samples, using the monofractal analysis with correlation function and correlation length of samples, were studied. The results show, however, that all samples are correlated and that the variation of ion doses has a negligible impact on the values of correlation lengths. Moreover, the study of height distribution and higher-order moments show the deviation from Gaussian distribution. The calculations of the roughness exponent and fractal dimension indicates that the implanted samples are the self-affine fractal surfaces.

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Section: Monofractal Analysis Of Roughness Based On Statistical Prope...mentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Microstructural and Energy-Dispersive X-ray Analyses on Argon Ion Implantations in Tantalum Thin Films for Microelectronic Substrates

et al. 2021

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“…For many years, the tantalum has been used in various experimental projects because of its low density, high corrosion resistance, and excellent biocompatibility [1][2][3]. The sputtering, ion implantation and ion coating are the different approaches for improving the tantalum surface [4].…”

Section: Introductionmentioning

confidence: 99%

The study of mechanical and statistical properties of nitrogen ion-implanted Tantalum bulk

Ramezani

Hoseinzadeh

Ebrahiminejad

et al. 2021

Optik

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Study of corrosion behaviour of Ti-coated AISI 316L stainless steel in a simulated body fluid solution

Cited by 2 publications

References 6 publications

Microstructural and Energy-Dispersive X-ray Analyses on Argon Ion Implantations in Tantalum Thin Films for Microelectronic Substrates

Microstructural and Energy-Dispersive X-ray Analyses on Argon Ion Implantations in Tantalum Thin Films for Microelectronic Substrates

The study of mechanical and statistical properties of nitrogen ion-implanted Tantalum bulk

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