2020
DOI: 10.1016/j.optmat.2020.110370
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Study of Al2O3 thin films by ALD using H2O and O3 as oxygen source for waveguide applications

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Cited by 8 publications
(3 citation statements)
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“…The aim of this paper is to explore the possibility of realizing integrated optics components by means of an Al 2 O 3 atomic layer deposition process (ALD) [21,22]. The synthesis of submicron optical waveguides and design of ring resonators by means of Al 2 O 3 atomic layer deposition technique has been performed [23].…”
Section: Introductionmentioning
confidence: 99%
“…The aim of this paper is to explore the possibility of realizing integrated optics components by means of an Al 2 O 3 atomic layer deposition process (ALD) [21,22]. The synthesis of submicron optical waveguides and design of ring resonators by means of Al 2 O 3 atomic layer deposition technique has been performed [23].…”
Section: Introductionmentioning
confidence: 99%
“…With the background of energy utilization and environmental protection, the photo-degradation of organic pollutants has been actively studied (Medda et al, 2020;Cheng et al, 2021a;Wang et al, 2021a). To reduce the pressure on the environment caused by organic pollutants, many processes including ozone-oxidation method, photo-degradation method, activated-carbon adsorption method, and so on have been designed to degrade the organic pollutants (Caballero-Espitia et al, 2020;Wang et al, 2021b;Wang et al, 2021c). Among these methods, the photo-degradation method is an efficient method to degrade organic dyes from wastewater.…”
Section: Introductionmentioning
confidence: 99%
“…This feature makes ALD suitable for use in electronic and photonic devices based on transparent and flexible substrates, including polymers or hybrid structures with organic or low-dimensional materials [ 3 , 4 , 5 ]. Furthermore, ALD is commonly used for the fabrication of high- k dielectrics, transparent conductive oxides (TCOs), or conductive materials as gate-dielectrics in metal-oxide-semiconductor (MOS) devices [ 6 , 7 ], materials for non-volatile memory (NVSM) structures [ 8 , 9 ], optical coatings in lasers or light-emitting devices (LEDs) [ 10 , 11 ], membranes [ 12 ], sensing devices [ 13 ], waveguides [ 14 ], or photovoltaics [ 15 , 16 ].…”
Section: Introductionmentioning
confidence: 99%