Study and Fabrication of Multi-Wavelength Laser Antireflection Film Using New Mixed Material

Yongliang, 杨永亮 Yang; Xiuhua, 付秀华 Fu; Guojun, 刘国军 Liu; Meixuan, 李美萱 Li; Daoqi, 杨道奇 Yang

doi:10.3788/cjl201138.1007002

Cited by 2 publications

(1 citation statement)

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“…From the table, it has been concluded that, in a certain range, with the increase of deposition rate or substrate temperature, vacuum degree, either ion beam density of ion source, the refractive index of H4 and SiO2 will be increased too [10][11] . The reason is that proper increase of deposition rate, substrate temperature ,vacuum degree and ion beam density of ion source can enhance the rate of film-forming particles at the surface of film ,compact the coating, enhance the refractive index of materials.…”

Section: Study On the Process Parametersmentioning

confidence: 99%

Research of Thin Film for Laser Polarization Beam Splitter

Pan

Liu

et al. 2015

KEM

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Based on the design theory of film stack,H4 and SiO2 were selected as the high and low refractive index materials respectively. Through optimization by Macleod and TFCalc software, plus considering the internal electric field intensity distribution of film and laser induced damage threshold as well,the beam-splitting film with Tp=65±5% and Ts=30±5% in the 600-700 band in condition of 45 °± 3 ° incident angle has been achieved. Adopting electron beam ion assisted deposition system to development, the deposition parameters of materials has been optimized via orthogonal matrix experiment. The fabrication of thin film for laser polarization beam splitter has been succeeded. Its optical properties, mechanical properties and resistance to environmental test of the film have been approved to meet all using requirements.

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Section: Study On the Process Parametersmentioning

confidence: 99%