2020
DOI: 10.1007/978-981-15-5089-8_44
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Study and Analysis of AlInN/GaN Based High Electron Mobility Transistor

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Cited by 7 publications
(1 citation statement)
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“…But the scaling of existing MOSFET technology is restricted by the short channel effects (SCEs) such as drain-induced barrier lowering (DIBL), degradation of the subthreshold slope, hot carrier injection (HCI), and channel length modulation (CLM), etc. MODFET or HEMT is a suitable candidate for overcoming these problems due to the higher mobility of electrons, higher f T , f MAX, and lower values of noise characteristics [1][2][3][4][5].…”
Section: Introductionmentioning
confidence: 99%
“…But the scaling of existing MOSFET technology is restricted by the short channel effects (SCEs) such as drain-induced barrier lowering (DIBL), degradation of the subthreshold slope, hot carrier injection (HCI), and channel length modulation (CLM), etc. MODFET or HEMT is a suitable candidate for overcoming these problems due to the higher mobility of electrons, higher f T , f MAX, and lower values of noise characteristics [1][2][3][4][5].…”
Section: Introductionmentioning
confidence: 99%