Studies on Head/Disc Contact Area Increase During Contact Start/Stop and Continuous Drag Testing of Thin Film Discs

Koka, Ramesh; Pitchford, Thomas; Jesh, Mark S.; Egbert, D.

doi:10.1080/10402009308983125

Cited by 8 publications

(1 citation statement)

References 2 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The consistent increase in friction is mainly due to the wear of the carbon film resulting in increasing real contact area. 25,26 Figures 16͑b͒ and 16͑c͒ show that nitrogenated carbon films processed with 15% and 30% N 2 exhibit better friction behavior than the film without nitrogen. The coefficient of friction is almost constant for the whole test duration.…”

Section: Contact-start-stop Experimentsmentioning

confidence: 99%

Nitrogen-induced modifications in microstructure and wear durability of ultrathin amorphous-carbon films

Wei

Zhang

Johnson

1998

Journal of Applied Physics

View full text Add to dashboard Cite

Effects of thermal annealing on the structural, mechanical, and tribological properties of hard fluorinated carbon films deposited by plasma enhanced chemical vapor deposition A systematic experimental investigation was carried out to understand the effects of nitrogenation on the microstructure and wear durability of thin amorphous-carbon films. The films were fabricated with 0%, 10%, 15%, 20%, 30%, 40%, and 50% N 2 in the sputter gas. Microstructure properties were characterized using Rutherford backscattering spectroscopy, electrical resistance, Raman spectroscopy, and x-ray photoelectron spectroscopy. Nanohardness and scratch wear resistance of the films were studied with an atomic force microscope equipped with a diamond tip. The head-disk interface tribological properties of the films were tested with industrial standard contact-start-stop wear instrumentation. The results indicate that the introduction of nitrogen into the carbon film increases the film lattice disorder and allows for the formation of carbon-nitrogen single, double, and triple bonds. The nitrogen atomic concentration in the film, electrical resistance, and the ratio of carbon-nitrogen bonds to carbon-carbon bonds increase with increasing N 2 in the sputter gas. A significant addition in CwN bond percentage is observed when the N 2 exceeds 30% in the sputter gas. Both the nanohardness and scratch wear resistance of the carbon film can be significantly improved by incorporating an optimized nitrogen concentration in the film. In this study, the film processed with 30% N 2 showed the highest nanohardness and wear resistance. The degraded nanowear resistance for the films processed with 40% and 50% N 2 is attributed to the significant addition of CwN bonds. Within a wide process range ͑15%-30% N 2 ͒, the films exhibit excellent tribological performances at the head-disk interface. The wear mechanisms from the contact-startstop wear tests are interpreted based on the understanding of film structures and film mechanical properties.

show abstract

Section: Contact-start-stop Experimentsmentioning

confidence: 99%