2011
DOI: 10.1016/j.jallcom.2010.10.016
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Studies of nanostructured copper/hydrogenated amorphous carbon multilayer films

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Cited by 53 publications
(29 citation statements)
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References 35 publications
(35 reference statements)
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“…Over the last decade, there has been a specific interest in the formation of copper-carbon nanocomposite films as wear resistant and low friction coatings for tribological applications [10][11][12][13][14][15]. Furthermore, the incorporation of copper has been reported to reduce the temperature-dependent electrical transport and also to enhance the absorbance of light which could be useful for some photovoltaic applications [13].…”
Section: Introductionmentioning
confidence: 99%
“…Over the last decade, there has been a specific interest in the formation of copper-carbon nanocomposite films as wear resistant and low friction coatings for tribological applications [10][11][12][13][14][15]. Furthermore, the incorporation of copper has been reported to reduce the temperature-dependent electrical transport and also to enhance the absorbance of light which could be useful for some photovoltaic applications [13].…”
Section: Introductionmentioning
confidence: 99%
“…The residual stress in these Cu/DLC bilayer films deposited on silicon wafer were determined from the change in the radius of curvature of the wafer, before and after deposition, using 500TC temperature controlled film stress measurement system (M/s FSM Frontier Semiconductor, USA). Stoney formula was used to evaluate residual stress and is given by the following equation: [2,20] …”
Section: Methodsmentioning
confidence: 99%
“…Observed AFM pictures clearly reveal the nanostructured morphology in which particles are uniformly distributed over entire surface. Recently, we observed nanostructured morphology by employing Cu/a-C : H multilayer structure [20]. The size of particles in Cu/DLC bilayer films was found to increase with increasing self bias.…”
Section: Atomic Force Microscopy (Afm) Analysismentioning
confidence: 99%
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