Studies of emittance of multiply charged ions extracted from high temperature superconducting electron cyclotron resonance ion source, PKDELIS

Rodrigues, G.; Lakshmy, P. S.; Kumar, Sarvesh; Mandal, A.; Kanjilal, D.; Baskaran, R.; Roy, A.

doi:10.1063/1.3298846

Cited by 4 publications

(2 citation statements)

References 8 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…For the sake of completeness and usefulness of such plasma studies at higher rf power levels in large volume ECR sources, the instabilities have also been observed experimentally by the same Fourier analysis technique for a high temperature superconducting ECR ion source also known as PKDELIS [41,42] and it has been observed that there is a similar set of plasma instabilities. The source has an axial field of 1.8 T and 1.5 T at the injection and extraction side, respectively.…”

Section: Plasma Instabilities At Higher Rf Power and Confinement Fmentioning

confidence: 99%

Experimental investigation of plasma instabilities by Fourier analysis in an electron cyclotron resonance ion source

Kumar

Sharma

et al. 2018

Phys. Rev. Accel. Beams

Self Cite

View full text Add to dashboard Cite

The plasma instabilities play an important role in an electron cyclotron resonance (ECR) ion source for the production of intense heavy ion beams in high charge states for particle accelerators. The geometrical and operational constraints of ECR sources hinder the trapping of ions for a sufficient time to get fully ionized with maximum efficiency. This problem is looked at in detail by studying the plasma instabilities in ECR ion sources. The ECR environment is full of complex rearrangements of various electric and magnetic fields to define a sustainable trap for the ions. The maximum frequency of plasma instability has been observed to be of 122.5 kHz under a set of sustainable plasma parameters. However, this limit may be pushed further if the plasma is overdriven in terms of source parameters. The instabilities cover a full regime of few tens of Hz to few hundreds of kHz under various operating conditions of radio frequency (rf), negative bias voltage, rf power and injection gas pressure. The rigorous details of frequencies and amplitudes of plasma instabilities are being reported by studying the Fourier spectrum of extracted and analyzed beam intensity. The plasma instabilities are attributed as drift waves in an inhomogeneous ECR plasma generated by the application of radio-frequency fields.

show abstract

Section: Plasma Instabilities At Higher Rf Power and Confinement Fmentioning

confidence: 99%

Experimental investigation of plasma instabilities by Fourier analysis in an electron cyclotron resonance ion source

Kumar

Sharma

et al. 2018

Phys. Rev. Accel. Beams

Self Cite

View full text Add to dashboard Cite

show abstract

“…This is especially true for the heavier ions since their measured beam emittances are much lower. 3 Therefore, the total beam energy coming from the ion source is the product of the charge state and the sum of the extraction voltage and the plasma potential assuming a uniform potential difference between the plasma and the chamber wall. Since a significant energy spread can influence the longitudinal optics, it was felt necessary to measure the plasma potentials for various ions and its dependance on source tuning parameters.…”

Section: Introductionmentioning

confidence: 99%

Effect of source tuning parameters on the plasma potential of heavy ions in the 18 GHz high temperature superconducting electron cyclotron resonance ion source

Rodrigues

Baskaran

Kukrety

et al. 2012

Review of Scientific Instruments

Self Cite

View full text Add to dashboard Cite

Plasma potentials for various heavy ions have been measured using the retarding field technique in the 18 GHz high temperature superconducting ECR ion source, PKDELIS [C. Bieth, S. Kantas, P. Sortais, D. Kanjilal, G. Rodrigues, S. Milward, S. Harrison, and R. McMahon, Nucl. Instrum. Methods B 235, 498 (2005); D. Kanjilal, G. Rodrigues, P. Kumar, A. Mandal, A. Roy, C. Bieth, S. Kantas, and P. Sortais, Rev. Sci. Instrum. 77, 03A317 (2006)]. The ion beam extracted from the source is decelerated close to the location of a mesh which is polarized to the source potential and beams having different plasma potentials are measured on a Faraday cup located downstream of the mesh. The influence of various source parameters, viz., RF power, gas pressure, magnetic field, negative dc bias, and gas mixing on the plasma potential is studied. The study helped to find an upper limit of the energy spread of the heavy ions, which can influence the design of the longitudinal optics of the high current injector being developed at the Inter University Accelerator Centre. It is observed that the plasma potentials are decreasing for increasing charge states and a mass effect is clearly observed for the ions with similar operating gas pressures. In the case of gas mixing, it is observed that the plasma potential minimizes at an optimum value of the gas pressure of the mixing gas and the mean charge state maximizes at this value. Details of the measurements carried out as a function of various source parameters and its impact on the longitudinal optics are presented.

show abstract

Low energy ion beam dynamics of NANOGAN ECR ion source

Kumar

Mandal

2016

Nuclear Instruments and Methods in Physics Research Section A:

View full text Add to dashboard Cite

Studies of emittance of multiply charged ions extracted from high temperature superconducting electron cyclotron resonance ion source, PKDELIS

Cited by 4 publications

References 8 publications

Experimental investigation of plasma instabilities by Fourier analysis in an electron cyclotron resonance ion source

Experimental investigation of plasma instabilities by Fourier analysis in an electron cyclotron resonance ion source

Effect of source tuning parameters on the plasma potential of heavy ions in the 18 GHz high temperature superconducting electron cyclotron resonance ion source

Low energy ion beam dynamics of NANOGAN ECR ion source

Contact Info

Product

Resources

About