Structures and properties of disordered boron carbide coatings generated by magnetron sputtering

Hu, Terry; Steihl, Lynn; Rafaniello, William; Fawcett, T. G.; Hawn, David D.; Mashall, Joan G.; Rozeveld, Steve; Putzig, C. L.; Blackson, John; Cermignani, W.; Robinson, Matt

doi:10.1016/s0040-6090(98)01019-0

Cited by 89 publications

(28 citation statements)

References 15 publications

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“…The RBS measurements indicated atomic ratio boron:carbon = 3.7:1, with 6% (atomic) oxygen present, averaged across the entire film thickness. The boron:carbon ratio is very close to the prescribed stoichiometry (4:1) of the sputtering target material and the overall composition (including the oxygen content) is consistent with earlier results reported in the literature for sputtered B 4 C thin films 19,20,21,22,23,24,25,26 . It was determined that the source of the 6% oxygen in the films is most likely the B 4 C sputtering target (i.e: oxygen was incorporated during target fabrication), as opposed to oxygen being present in the environment during deposition.…”

Section: Boron Carbide Reflective Coatings For the Lcls Soms Mirrorssupporting

confidence: 90%

Morphology, microstructure, stress and damage properties of thin film coatings for the LCLS x-ray mirrors

et al. 2009

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The development and properties of reflective coatings for the x-ray offset mirror systems of the Linac Coherent Light Source (LCLS) free-electron laser (FEL) are discussed in this manuscript. The uniquely high instantaneous dose of the LCLS FEL beam translates to strict limits in terms of materials choice, thus leading to an x-ray mirror design consisting of a reflective coating deposited on a silicon substrate. Coherent wavefront preservation requirements for these mirrors result in stringent surface figure and finish specifications. DC-magnetron sputtered B 4 C and SiC thin film coatings with optimized stress, roughness and figure properties for the LCLS x-ray mirrors are presented. The evolution of microstructure, morphology, and stress of these thin films versus deposition conditions is discussed. Experimental results on the performance of these coatings with respect to FEL damage are also presented.

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Section: Boron Carbide Reflective Coatings For the Lcls Soms Mirrorssupporting

confidence: 90%

Morphology, microstructure, stress and damage properties of thin film coatings for the LCLS x-ray mirrors

et al. 2009

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“…In what concerns XPS measurements of boron carbide films deposited by sputtering at room temperature, Hu et al identified the carbide peak at 188.4 and 283.5 eV, and oxide-related species at 191.4 and 286-288 eV in the B 1s and C 1s spectra, respectively. Moreover, the C 1s spectrum presented a strong peak at 284.5 eV that was assigned to aliphatic carbon originated in surface contamination of the samples [23]. According to Pascual et al, who sputtercleaned the surface of their samples, the major contribution to the B 1s line is elemental B at 188 eV with a minor contribution of B-C bonds at 186.5 eV, while the C 1s line located at 283 eV is ascribed to B-C bonds [24].…”

Section: Introductionmentioning

confidence: 99%

X-ray photoelectron spectroscopy investigation of boron carbide films deposited by sputtering

et al. 2004

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“…Boron carbide films, for example, have been used in plastic injection molds, automotive transmission gears and cutting tools [9]. One of the main limitations for the large scale use of such films is their high internal stress since it reduces the film-substrate adhesion and makes the deposition of films thicker than few hundreds of nanometers prohibitive due to film delamination [10].…”

Section: Introductionmentioning

confidence: 99%

Boron Carbide and Boron-Carbon Nitride Films Deposited by DC-Magnetron Sputtering: Structural Characterization and Nanotribological Properties

Freire

Reigada

Prioli

2001

phys. stat. sol. (a)

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The effects of nitrogen incorporation into amorphous boron carbide (B 4 C) films were studied. The films were deposited by dc-magnetron sputtering with the Si substrates at room temperature. The nitrogen incorporation occurs at the expense of the boron content. The main feature of infrared absorption spectra obtained from B 4 C films is a broad band at around 1100 cm --1 that shifts to higher wavenumbers upon nitrogen incorporation. The spectra obtained from films with higher nitrogen content are typical of hexagonal boron nitride. The friction coefficient and the surface wear were studied by lateral force microscopy. The influence of several parameters like relative humidity, scanning velocity and load force was investigated. For boron-carbon nitride films, a weak dependence on the relative humidity of wear and friction coefficients was observed. In the case of B 4 C films, there is a clear correlation between the wear depth and the energy deposited at the AFM tip-film interface.

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Structures and properties of disordered boron carbide coatings generated by magnetron sputtering

Cited by 89 publications

References 15 publications

Morphology, microstructure, stress and damage properties of thin film coatings for the LCLS x-ray mirrors

Morphology, microstructure, stress and damage properties of thin film coatings for the LCLS x-ray mirrors

X-ray photoelectron spectroscopy investigation of boron carbide films deposited by sputtering

Boron Carbide and Boron-Carbon Nitride Films Deposited by DC-Magnetron Sputtering: Structural Characterization and Nanotribological Properties

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