Science and Technology Against Microbial Pathogens 2011
DOI: 10.1142/9789814354868_0036
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Structure-reactivity relations for DC-magnetron sputtered Cu-layers during E. coli inactivation in the dark and under light

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Cited by 10 publications
(27 citation statements)
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“…The significantly higher bacterial inactivation activity of the Cu fixed on cotton by DCMSP suggests that Cu sites exposed on the surface or inside the cotton interact with E. coli regardless of any agglomeration on the surface of the cotton fiber. This is different to the cotton with DCMS samples (Castro et al 2010) where the catalytic activity per atom decreases due to the agglomeration of Cu nanoparticles at higher sputtering times. Figure 3 presents the inactivation times for E. coli obtained by HIPIMS Cu samples at 6 amps when the sputtering has been applied between 2 and 21 s (Kusiak-Nejman et al 2011).…”
Section: Resultscontrasting
confidence: 60%
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“…The significantly higher bacterial inactivation activity of the Cu fixed on cotton by DCMSP suggests that Cu sites exposed on the surface or inside the cotton interact with E. coli regardless of any agglomeration on the surface of the cotton fiber. This is different to the cotton with DCMS samples (Castro et al 2010) where the catalytic activity per atom decreases due to the agglomeration of Cu nanoparticles at higher sputtering times. Figure 3 presents the inactivation times for E. coli obtained by HIPIMS Cu samples at 6 amps when the sputtering has been applied between 2 and 21 s (Kusiak-Nejman et al 2011).…”
Section: Resultscontrasting
confidence: 60%
“…DC-magnetron sputtered semi-transparent Cu gray-brown films (Castro et al 2010) on cotton are effective in the inactivation of E. coli K12. Figure 1 shows the inactivation of E. coli on Cu-sputtered samples by DC pulsed magnetron sputtering (DCMS).…”
Section: Resultsmentioning
confidence: 99%
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