Structure of diamond-like carbon films containing transition metals deposited by reactive magnetron sputtering

Corbella, Carles; Oncins, Gerard; Botero, Maryory Astrid Gómez; Polo, M.C.; Pascual, E.; García-Céspedes, J.; Andújar, J.L.; Bertrán, E.

doi:10.1016/j.diamond.2004.10.029

Cited by 64 publications

(34 citation statements)

References 13 publications

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“…This is in agreement with the findings of Corbella et al [13,22], who observed an approximately linear relationship between the hardness and the tungsten content of their studied a-C:H:W coatings, which decreases with increasing ethine flow rate. The general trend in the relationship between hardness and ethine flow rate found here also agrees with these findings.…”

Section: Effect Of the Ethine Flow Ratesupporting

confidence: 82%

Empirical-Statistical Study on the Relationship between Deposition Parameters, Process Variables, Deposition Rate and Mechanical Properties of a-C:H:W Coatings

et al. 2014

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Tungsten-modified hydrogenated amorphous carbon coatings (a-C:H:W) were deposited on high speed steel by reactive magnetron sputtering of a tungsten carbide target in an argon-ethine atmosphere. The deposition parameters, sputtering power, bias voltage, argon and ethine flow rate, were varied according to a central composite design comprising 25 different parameter combinations. For comparison, a tungsten carbide coating was deposited, as well. During coating deposition, the process variables, total pressure, sputtering voltage and bias current, were measured as process characteristics. The thickness of the deposited coatings was determined using the crater grinding method, and the deposition rate was calculated. Young's modulus E and indentation hardness H IT were characterized by means of nanoindentation. With E = 80 − 253 GPa and H IT = 7.8 − 22.0 GPa, the mechanical properties were found to vary strongly in between different a-C:H:W variants. Using statistical methods, it is shown that these properties, as well as the deposition rate significantly depend on all four varied parameters. Despite a very similar influence of the parameters on modulus and hardness, as well as a very strong correlation of both properties, it is pointed out statistically that the H/E ratio, which is an indicator of the wear resistance, can be adapted in a targeted way and with some degree of independence.

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Section: Effect Of the Ethine Flow Ratesupporting

confidence: 82%

Empirical-Statistical Study on the Relationship between Deposition Parameters, Process Variables, Deposition Rate and Mechanical Properties of a-C:H:W Coatings

et al. 2014

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“…Another approach to overcome the aspects of low adhesion and high compressive stress is to incorporate W into the DLC coating. The W -doping significantly reduces the internal residual stress of the coating, thus the coating-substrate adhesion is improved [7,9,10]. Moreover, the graded design in both coating's microstructure and composition significantly improve the coating-substrate adhesion.…”

Section: Introductionmentioning

confidence: 99%

Tribological behaviour of Mo–W doped carbon-based coating at ambient condition

Mandal

Ehiasarian

Hovsepian

2015

Tribology International

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“…Doping of (hydrogenated) amorphous carbon films with transition metals (a-C:Me, a-C:H:Me) is a way to improve their properties in respect to hardness, wear resistance, stress and electrical conductivity [1][2][3][4][5][6] . In nuclear fusion research, a-C:Me films are used as a model material to study the influence of metal-doping on the reactivity of carbon against hydrogen species (chemical sputtering) [7][8][9] .…”

Section: Introductionmentioning

confidence: 99%

Influence of doping (Ti, V, Zr, W) and annealing on the sp2 carbon structure of amorphous carbon films

Adelhelm

Balden

Rinke

et al. 2009

Journal of Applied Physics

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The influence of the transition metal (Ti, V, Zr, W) doping on the carbon matrix nanostructuring during the thin film growth and subsequent annealing is investigated. Pure and metal-doped amorphous carbon films (a-C, a-C:Me) were deposited at room temperature by non-reactive magnetron sputtering. The carbon structure of as-deposited and post-annealed (up to 1300 K) samples was analyzed by X-ray diffraction (XRD) and Raman spectroscopy.The existence of graphene-like regions in a-C is concluded from a (10) diffraction peak. A comparison of the XRD and Raman results suggests that XRD probes only the small amount of 2-3 nm large graphene-like regions, whereas the majority of the sp 2 phase is present in smaller distorted aromatic clusters which are probed only by Raman spectroscopy. Annealing leads to an increase of the graphene size and the aromatic cluster size. During the carbon film growth the addition of metals enhances ordering of sp 2 carbon in sixfold aromatic clusters compared to a-C, Ti and Zr showing the strongest effect, W the lowest. This order qualitatively corresponds with the catalytic activity of the respective carbides found during graphitization of carbide-doped graphites published in the literature. With annealing, carbide crystallite formation and growth occurs in a-C:Me films, which destroys the initial carbon structure, reduces the size of the initially formed aromatic clusters and the differences in carbon structure introduced by different dopants. For high annealing temperatures the carbon structure of a-C:Me films is similar to that of a-C, and is determined only by the annealing temperature.2

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Structure of diamond-like carbon films containing transition metals deposited by reactive magnetron sputtering

Cited by 64 publications

References 13 publications

Empirical-Statistical Study on the Relationship between Deposition Parameters, Process Variables, Deposition Rate and Mechanical Properties of a-C:H:W Coatings

Empirical-Statistical Study on the Relationship between Deposition Parameters, Process Variables, Deposition Rate and Mechanical Properties of a-C:H:W Coatings

Tribological behaviour of Mo–W doped carbon-based coating at ambient condition

Influence of doping (Ti, V, Zr, W) and annealing on the sp2 carbon structure of amorphous carbon films

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