Structure, mechanical and tribological properties of nitrogen-containing chromium coatings prepared by reactive magnetron sputtering

Rebholz, Claus; Ziegele, H.; Leyland, A.; Matthews, A.

doi:10.1016/s0257-8972(99)00240-6

Cited by 183 publications

(64 citation statements)

References 44 publications

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“…The phenomenon was, however, limited only to samples containing the hexagonal closed-packed β-Cr 2 N phase, with 20.5-33 at% nitrogen, whereas samples with lower (7.5 at%) and higher (46.5 at%) nitrogen content were characterized by a dense columnar structure. Such results were also reported by Rebholz et al [46] (featureless SEM cross sections at a nitrogen content of 29 at%).…”

Section: Resultssupporting

confidence: 88%

$\hbox{CrN}_{\rm x}$ Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study

Greczyński

Jensen

Hultman

2010

IEEE Trans. Plasma Sci.

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Abstract-CrN x (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission strength from the Cr ions relative to Cr neutrals, in agreement with the predictions of the target-pathway model. The low deposition rate in HiPIMS is thus a direct consequence of the high ionization level (∼56%) of the target material and effective capturing of Cr ions by the cathode potential. Although the HiPIMS deposition rate did not exceed 40% of the DCMS rate, the drop in the relative deposition rate upon increasing the N 2 -to-Ar flow ratio, f N 2 /Ar , was found to be similar for both sputtering techniques. Films prepared by HiPIMS contained similar amounts of atomic nitrogen as the dc-sputtered samples grown at the same f N 2 /Ar , indicating that the nitride formation at the substrate takes place mostly during the time period of the high-power pulses, and the N 2 uptake between the pulses is negligible. The microstructure evolution in the two types of CrN x films, however, differed clearly from each other. A combination of a high substrate bias and a high flux of doubly charged Cr ions present during the HiPIMS discharge led to a disruption of the grain growth and renucleation, which resulted in column-free films with nanosized grains not observed in the conventional DCMS-based process. The comparison of nanoindentation hardness as a function of f N 2 /Ar revealed superior properties of HiPIMS-sputtered films in the entire range of gas compositions.Index Terms-CrN, high-power impulse magnetron sputtering (HiPIMS), high-power pulsed magnetron sputtering, magnetron sputtering.

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Section: Resultssupporting

confidence: 88%

$\hbox{CrN}_{\rm x}$ Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study

Greczyński

Jensen

Hultman

2010

IEEE Trans. Plasma Sci.

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“…Cr-N was chosen as a model system due to the limited reactivity of Cr towards nitrogen (resulting in a high partial pressure required for a turnover from metallic to nitrided target state), which allows for a better control of film composition while investigating the relationship between the flow of reactive gas and the pulsing frequency [24]. In contrast, N-rich CrN x films have been deposited by a number of sputtering techniques and are relatively well characterized [25][26][27][28][29][30][31].…”

Section: High Power Impulse Magnetron Sputtering (Hipims or Hppms) Ismentioning

confidence: 99%

Microstructure control of CrNx films during high power impulse magnetron sputtering

Greczyński

Jensen

Böhlmark

et al. 2010

Surface and Coatings Technology

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The microstructure and composition of CrN x ( 1 0 x ) films grown by reactive High Power Pulsed Magnetron Sputtering (HIPIMS or HPPMS) have been studied as a function of the process parameters: N 2 -to-Ar discharge gas ratio, (f N2/Ar ), negative substrate bias (V s ), pulsing frequency, and energy per pulse. The film stoichiometry is found to be determined by the composition of the material flux incident upon the substrate during the active phase of the discharge with no nitrogen uptake between the high-power pulses. Scanning electron microscopy investigations reveal that for 0 < f N2/Ar < 0.15 and 150 V bias, a columnar film growth is

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“…To deposit the hard coating, sputtering is normally used from the available processes because of its high deposition rate, thin compound nature with controlled stoichiometry, simplicity and cost-effectiveness compared to the radio frequency (RF) system. Among the various techniques available for the deposition of CrN thin films, reactive magnetron sputtering could be effectively used to tailor the micro structural features of the films [9][10][11][12][13][14][15][16][17]. For some years, chromium nitride coatings have been gaining popularity and becoming important technological materials in the fields of cutting and forming tools, bearing and machine parts, dies and moulds.…”

Section: Introductionmentioning

confidence: 99%

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Shah¹

2017

Int. J. Automot. Mech. Eng.

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Chromium Nitride (CrN) thin films are known for their comparatively good mechanical properties. CrN was deposited on Silicon (100) and glass substrates by using DC magnetron sputtering and the influence of the partial nitrogen content and different gaseous environment on their microstructural characteristics were investigated in the present work. The CrN films were characterised with X-Ray Diffraction (XRD), Field Emission Scanning Electron Microscopy (FE-SEM), Atomic Force Microscopy (AFM) and Nanoindentation was used to characterise the structural and mechanical properties of the deposited thin film. The films showed the [200] preferred orientation at lower (at 20%) nitrogen contents while the intensity of the peak [111] increases with the increase in the nitrogen content. The Cr2N (220) peak was identified at a nitrogen content above 30%, but for nitrogen content above 40%, the CrN phase was observed in both films deposited on Si(100) and glass substrates. The preferred orientations of the CrN thin films are strongly influenced by the nitrogen content inside the chamber as observed in the present work. The surface roughness and deposition rate were observed in a reducing trend with the increasing N2 content and temperature from 20.31 to 2.71nm and from 30.16 nm/min to 25.66nm/min, respectively. The hardness and modulus of pure N2 films deposited on the Si substrates were evaluated by nanoindentaion testing and indicated 31 GPa and 250 GPa, respectively.

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Structure, mechanical and tribological properties of nitrogen-containing chromium coatings prepared by reactive magnetron sputtering

Cited by 183 publications

References 44 publications

$\hbox{CrN}_{\rm x}$ Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study

$\hbox{CrN}_{\rm x}$ Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study

Microstructure control of CrNx films during high power impulse magnetron sputtering

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

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