A chemical approach
to the deposition of thin films on solid surfaces
is highly desirable but prone to affect the final properties of the
film. To better understand the origin of these complications, the
initial stages of the atomic layer deposition of titania films on
silica mesoporous materials were characterized. Adsorption–desorption
measurements indicated that the films grow in a layer-by-layer fashion,
as desired, but initially exhibit surprisingly low densities, about
one-quarter of that of bulk titanium oxide. Electron microscopy, X-ray
diffraction, UV/visible, and X-ray absorption spectroscopy data pointed
to the amorphous nature of the first monolayers, and EXAFS and 29Si CP/MAS NMR results to an initial growth via the formation
of individual tetrahedral Ti–oxide units on isolated Si–OH
surface groups with unusually long Ti–O bonds. Density functional
theory calculations were used to propose a mechanism where the film
growth starts at the nucleation centers to form an open 2D structure.