Structure and property of epitaxial titanium oxynitride grown on MgO(001) substrate by pulsed laser deposition

Binh, Huy; Wu, Yue; Dai, Van Truong; Peng, Chun; Yen, Tzu Chun; Chang, Li

doi:10.1016/j.surfcoat.2012.11.008

Cited by 18 publications

(9 citation statements)

References 38 publications

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“…Since many of our 'most metallic' films were sputtered onto MgO, we focus on TiN films on this substrate to investigate structural and composition changes. With proper optimization of the chamber conditions, highly textured and even epitaxial growth of TiN on MgO can occur since MgO and stoichiometric TiN are closely lattice matched cubic crystals with lattice constants of 4.212 and 4.240 Å respectively [16][17][18]. It has been shown that crystalline TiN films exhibit metallic behavior whereas amorphous films do not [16,38] and in fact, as we have noted, better crystallinity is, in general, correlated with the more metallic behavior we observe.…”

Section: Discussionsupporting

confidence: 55%

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Optimization of sputtered titanium nitride as a tunable metal for plasmonic applications

Zgrabik

2015

Opt. Mater. Express

102

100

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Alternative materials for plasmonic devices have garnered much recent interest. A promising candidate material is titanium nitride. Although there is a substantial body of work on the formation of this material, its use for plasmonic applications requires a more systematic and detailed optical analysis than has previously been carried out. This paper describes an initial optimization of sputtered TiN thin films for plasmonic performance from visible into near-IR wavelengths. The metallic behavior of TiN films exhibits a sensitive dependence on the substrate and deposition details. We explored reactive and non-reactive sputter deposition of TiN onto various substrates at both room temperature and 600°C. Metallic character was compared for films grown under different conditions via spectroscopic ellipsometry and correlated with compositional and structural measurements via x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD), and scanning transmission electron microscopy (STEM).

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Section: Discussionsupporting

confidence: 55%

“…Sputtered thin films of TiN exhibit varied mechanical [17][18][19], structural [17,18,[20][21][22], and optical behavior [23][24][25][26][27][28][29]. A recent review highlights the optical studies of TiN prior to this study showing a wide range of behavior [30].…”

Section: Introductionmentioning

confidence: 99%

Optimization of sputtered titanium nitride as a tunable metal for plasmonic applications

Zgrabik

2015

Opt. Mater. Express

102

100

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“…spray pyrolysis [15], sol-gel method [16], atmospheric pressure chemical vapor deposition [17], ion-assisted electron beam evaporation [18], atomic layer deposition [19] and sputtering [20,21]. The synthesis of these films by pulsed laser deposition (PLD) was also studied by several groups in the last decade [22][23][24][25][26][27][28][29][30][31][32][33][34][35][36][37][38][39]. Nitrogen containing titanium-oxide films can easily be made by PLD via varying the experimental conditions, most importantly by ablating different targets (Ti [22][23][24], TiO [24], TiO 2 [24][25][26][27][28][29][30][31][32][33], TiN [24,34], pre-mixed (TiO 2 + TiN) [35,36] and TiNO [37]) in a variety of atmospheres (N 2 [25][26]<...>…”

Section: N-doped Tio 2 Thin Films Have Been Prepared By Various Deposmentioning

confidence: 99%

Optical, compositional and structural properties of pulsed laser deposited nitrogen-doped Titanium-dioxide

Farkas¹,

Heszler²,

Budai³

et al. 2018

Applied Surface Science

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N-doped TiO 2 thin films were prepared using pulsed laser deposition by ablating metallic Ti target with pulses of 248 nm wavelength, at 330 ºC substrate temperature in reactive atmospheres of N 2 /O 2 gas mixtures. These films were characterized by spectroscopic ellipsometry, X-ray photoelectron spectroscopy and X-ray diffraction. Optical properties are presented as a function of the N 2 content in the processing gas mixture and correlated to nitrogen incorporation into the deposited layers. In case of extinction coefficient, refractive index and optical band gap values a monotonically increasing tendency, a maximum and a linearly decreasing slope can be observed with increasing N concentration, respectively. It is also shown that the amount of substitutional N can be increased up to 7.7 at.%, but the high dopant concentration inhibits the crystallization of the samples. No peaks of crystalline titanium-nitride were detected despite the large amount of substitutionally incorporated nitrogen.

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“…The microstructure, electrical, and mechanical properties have been characterized, which are shown elsewhere. 22 The surface morphology of as-grown and hydrogen plasma treated samples A, B, C, D, and E (Table I) was examined with AFM. As seen clearly in Fig.…”

Section: Resultsmentioning

confidence: 99%

“…It is also noticed that the use of highquality epitaxial TiNO films in many applications can improve electrical properties and remove the problems of fast grain boundary diffusion of dopants and impurities in the polycrystalline films of columnar grains. 22 The etch mechanism and the changes in chemical composition and surface morphology were also investigated.…”

Section: Introductionmentioning

confidence: 99%

Stability and etching of titanium oxynitride films in hydrogen microwave plasma

Binh

Yen

Chang

2013

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Epitaxial titanium oxynitride (TiNO) films deposited on MgO by pulsed laser deposition were treated in hydrogen microwave plasma. Scanning electron microscopy and x-ray photoelectron spectroscopy were used to examine the stability and etching of TiNO which strongly depended on hydrogen gas pressure. TiNO was very chemically stable and remained with good crystallinity under hydrogen pressure below 5300 Pa. With increase of pressure, it may lead to the formation of etch pits in inverse pyramid shape. The etch mechanism as well as the effects of gas pressure and etching time are also presented. V

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Structure and property of epitaxial titanium oxynitride grown on MgO(001) substrate by pulsed laser deposition

Cited by 18 publications

References 38 publications

Optimization of sputtered titanium nitride as a tunable metal for plasmonic applications

Optimization of sputtered titanium nitride as a tunable metal for plasmonic applications

Optical, compositional and structural properties of pulsed laser deposited nitrogen-doped Titanium-dioxide

Stability and etching of titanium oxynitride films in hydrogen microwave plasma

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