Structure and properties of Ti–Al–Y–N coatings deposited from filtered vacuum-arc plasma

Белоус, В.А.; Vasyliev, V.V.; Goltvyanytsya, Volodymyr; Goltvyanytsya, S.K.; Luchaninov, A.A.; Reshetnyak, E.N.; Strel’nitskij, V.E.; Tolmacheva, G. N.; Danylina, O.

doi:10.1016/j.surfcoat.2011.09.061

Cited by 29 publications

(10 citation statements)

References 18 publications

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“…Similar changes were previously observed for coatings with a NaCl type structure, which are deposited under ion bombardment conditions. For example, in vacuum-arc coatings TiN, (Ti, Al)N, (Ti, Cr)N, which are deposited from a highly ionized stream of filtered vacuum-arc plasma, with an increase in the amplitude of the pulse bias potential, the orientation of the grains of cubic nitride changes from (111) to (220), and then to (200), which is accompanied by a decrease in the level of residual compressive stresses [18][19][20][21]. Changes are considered as a result of competition between the processes of the appearance and annealing of point defects in the thermal peaks of bombarding ions, which are aimed at minimizing the free energy of the system [22].…”

Section: Fig 6 -Effect Of the Bias Potential On The Crystal Lattice mentioning

confidence: 99%

Coating Deposition by Ion-plasma Sputtering of MAX Phase Ti2AlC Target

Куприн¹,

Prikhna²,

Reshetnyak³

et al. 2020

J. Nano- Electron. Phys.

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The process of coating deposition by sputtering a target based on the MAX phase Ti2AlC using a gas plasma source has been studied. It has been shown that the MAX phase of Ti2AlC refers to hard-sputtering materials. With an increase in the sputtering energy of Ar + ions from 400 to 1200 eV, the sputtering coefficient of the target based on the MAX phase increases from 0.2 to 0.7 atom/ion. The obtained values are 1.5 times lower than the sputtering coefficients of the target from titanium. Phase transformations occur on the target surface and are associated with the decay of the MAX phase and the selective sputtering of lighter elements due to the bombardment by Ar + ions. It was found that the composition of the deposited coatings is significantly affected by the magnitude of the bias potential on the substrate. With increasing potential in the range from 50 to 200 V, the relative aluminum content in the coatings drops sharply, in favor of titanium from Ti:Al  3.5:1 to Ti:Al  48:1. Regardless of the composition, a solid solution (Ti, Al)C is formed in the coatings with a cubic crystal lattice of the NaCl type, a crystallite size of 10-15 nm and an axial type texture. The MAX phase Ti2AlC was not detected in the coatings. Received coatings have high hardness and Young's modulus, which increase with decreasing aluminum concentration in the ranges of 21-30 GPa and 290-340 GPa.

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Section: Fig 6 -Effect Of the Bias Potential On The Crystal Lattice mentioning

confidence: 99%

Coating Deposition by Ion-plasma Sputtering of MAX Phase Ti2AlC Target

Куприн¹,

Prikhna²,

Reshetnyak³

et al. 2020

J. Nano- Electron. Phys.

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“…Recent research has shown that surface treatment can introduce the right amount of reactive yttrium (Y) content into nitride hard films, thereby improving their hardness, adsorption capacity, and resistance to high-temperature oxidation. Additionally, rare earth elements possess a surface purification effect that facilitates the adsorption, deposition, and diffusion of atoms in coatings, reducing deposition times [6][7][8][9]. Moser et al [10,11] found that Y doping enhances the hardness and thermal stability of TiAlN films through solid solution strengthening.…”

Section: Introductionmentioning

confidence: 99%

“…The aforementioned studies indicate that the addition of an appropriate amount of a rare earth element can substantially improve the hardness and oxidation resistance of nitride films. Y is an ideal doping element for high-temperature cutting coatings [15,16].…”

Section: Introductionmentioning

confidence: 99%

Effects of yttrium doping on high-temperature oxidation, friction, and wear properties of CrAlN films

Wang,

Wang

2024

Mater. Res. Express

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This study investigates the deposition of CrAlYN nanomultilayer films with different yttrium (Y) contents on M2 tool steel and single-crystal Si wafer using unbalanced magnetron-sputtering ion-plating technology. Transmission and scanning electron microscopic and scanning morphologies, X-ray diffraction pattern, energy dispersive spectra, nanoindentation, high-temperature oxidation, and high-temperature tribological analyses show that CrAlYN nanomultilayer films have a face-centered cubic (fcc) crystal structure with a modulation period of CrN/YN+AlN/CrN/AlN. CrAlYN films exhibit optimal mechanical performance when Y content is 1.13at%. However, a substantial drop occurs when Y content increases to 2.67at%. As Y content increases, the high-temperature oxidation resistance, friction, and wear of CrAlYN films first increase and then decrease. Notably, films with the Y content of 1.13at% have optimal resistance to high-temperature oxidation, friction, and wear.

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“…19,20 This technique utilizes the cathode vacuum arc discharge and produces high density metal plasma. 24,25 By means of magnetic lter technique, we can obtain homogeneous metal plasma. In order to obtain high quality thin lm, these macroparticles must be removed.…”

Section: Introductionmentioning

confidence: 99%

“…Metal plasma will move along the direction of magnetic eld and reach the vacuum chamber, however the macroparticles won't. 24,25 By means of magnetic lter technique, we can obtain homogeneous metal plasma. Finally, the metal plasma will be deposited on the CP in vacuum chamber in a very short time.…”

Section: Introductionmentioning

confidence: 99%

Characterization and electrochemical properties of a nickel film/carbon paper electrode prepared by a filtered cathodic vacuum arc technique

Wang

et al. 2015

RSC Adv.

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A nickel film was prepared through plasma deposition of a metal onto a carbon paper (CP) substrate with the filtered cathodic vacuum arc technique. Nickel metal plasma was generated at a current of 90 A and deposited on the CP substrate for 3 seconds, forming the nickel film modified electrode. The morphology image of the nickel film on the substrate surface was characterized by scanning electron microscopy (SEM). The existence of the nickel film was verified by energy dispersive spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS). The results of the water contact angle measurement (WCA) showed that the existence of the nickel film improved the hydrophilicity of the CP. Cyclic voltammetry (CV) was carried out to investigate the electrochemical properties of the Ni/CP electrode. The nickel film provided a good electron conduction pathway and it improved the electron transfer ability of the substrate. It was found that the Ni/CP electrode exhibited good electrocatalytic oxidation behaviour towards glucose. Amperometric responses showed a good linear relationship with glucose concentration in the range from 2 mM to 500 mM with a detection limit of 0.6 mM. Thus this material is expected to have wide potential applications in glucose biosensors. Electrochemical characterization of Ni/CP electrodeCV was employed to investigate the electrochemical behaviour of the CP and Ni/CP electrode with the redox system serving as the probe such as [Fe(CN) 6 ] 3À /[Fe(CN) 6 ] 4À . Fig. 5 showed CVs for an aqueous solution of 5 mM [Fe(CN) 6 ] 3À /[Fe(CN) 6 ] 4À in 0.1 M 54778 | RSC Adv., 2015, 5, 54777-54782 This journal is

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Structure and properties of Ti–Al–Y–N coatings deposited from filtered vacuum-arc plasma

Cited by 29 publications

References 18 publications

Coating Deposition by Ion-plasma Sputtering of MAX Phase Ti2AlC Target

Coating Deposition by Ion-plasma Sputtering of MAX Phase Ti2AlC Target

Effects of yttrium doping on high-temperature oxidation, friction, and wear properties of CrAlN films

Characterization and electrochemical properties of a nickel film/carbon paper electrode prepared by a filtered cathodic vacuum arc technique

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