2021
DOI: 10.1016/j.mtcomm.2020.101739
|View full text |Cite
|
Sign up to set email alerts
|

Structure and photocatalytic properties of TiO2/Cu3N composite films prepared by magnetron sputtering

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
10
0

Year Published

2022
2022
2024
2024

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(10 citation statements)
references
References 43 publications
0
10
0
Order By: Relevance
“…For instance, Zhu et al demonstrated that the degradation of MO using TiO 2 @Cu 3 N thin films (effective band gap = 3.0 eV) is higher than in pure TiO 2 thin films, as seen in Figure 8b [35]. A degradation rate of 99.2% of MO solution with an initial concentration of 20 g/mL using a 500 W mercury lamp for 30 min was obtained [84]. Other studies using Cu 3 N@MoS 2 thin films (band gap = 2.05 eV) as photocatalysts obtained a 98.3% degradation rate of MO with an initial concentration of 10 mg/mL in 30 min.…”
Section: Photocatalytic Activity Of Cu 3 N Nanoparticlesmentioning
confidence: 96%
See 3 more Smart Citations
“…For instance, Zhu et al demonstrated that the degradation of MO using TiO 2 @Cu 3 N thin films (effective band gap = 3.0 eV) is higher than in pure TiO 2 thin films, as seen in Figure 8b [35]. A degradation rate of 99.2% of MO solution with an initial concentration of 20 g/mL using a 500 W mercury lamp for 30 min was obtained [84]. Other studies using Cu 3 N@MoS 2 thin films (band gap = 2.05 eV) as photocatalysts obtained a 98.3% degradation rate of MO with an initial concentration of 10 mg/mL in 30 min.…”
Section: Photocatalytic Activity Of Cu 3 N Nanoparticlesmentioning
confidence: 96%
“…For example, TiO 2 -Cu 3 N nanocomposites manifest an improved bandgap compared to Cu 3 N alone. Zhu et al also reported the growth of TiO 2 -Cu 3 N and Cu 3 N-MoS 2 nanocomposite films by magnetron sputtering that demonstrate enhanced photocatalytic properties [35,84]. Both TiO 2 and MoS 2 are n-type semiconductors that, when combined with p-type Cu 3 N, create p-n junctions.…”
Section: Thin Film Deposition Techniquesmentioning
confidence: 99%
See 2 more Smart Citations
“…16 Recently, Cu 3 N has been reported to be a kind of nontoxic and inexpensive semiconductor, which can be p-type or n-type depending on the Cu-poor or Cu-rich fabrication condition, respectively. [17][18][19] Cu 3 N has a typical anti-ReO 3 crystal structure 20 and has a tunable narrow band gap of 0.2-2.0 eV. 17,20,21 Furthermore, Cu 3 N has been reported to be applied in selectively converting methanol to formate, 22 degradation of methyl orange 20 and UV photodetection 23 due to its exceptional optical and electrical properties.…”
Section: Introductionmentioning
confidence: 99%