Structure and mechanical properties of δ-NbN/SiNx and δ′-NbN/SiNx nano-multilayer films deposited by reactive magnetron sputtering

Wen, Mao; Hu, Chaoquan; An, Tong; Su, Yanqing; Yu, Weili; Zheng, Weitao

doi:10.1016/j.surfcoat.2009.01.002

Cited by 28 publications

(14 citation statements)

References 34 publications

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“…The NbN films were also prepared by using magnetron sputtering (MS) [14][15][16][17][18], ion Contents lists available at ScienceDirect journal homepage: www.elsevier.com/locate/ceramint beam assisted deposition [19], pulsed laser deposition [20]. An increase in hardness was reached by the formation of the nanocomposite or nanolayered structures in ternary Nb-Si-N films [21][22][23][24][25][26][27][28][29]. Silicon nitride is known for its high temperature stability, low friction coefficient and high oxidation resistance.…”

Section: Introductionmentioning

confidence: 99%

Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Pogrebnjak

Бондар

Abadias

et al. 2016

Ceramics International

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a b s t r a c tThe structural and mechanical properties of NbN and Nb-Si-N films have been investigated both experimentally and theoretically, in their as-deposited and annealed states. The films were deposited using magnetron sputtering at substrate bias (U B ) between 0 and À 70 V. While NbN films were found to crystallize in the cubic δ-NbN structure, Nb-Si-N films with Si content of 11-13 at% consisted of a twophases nanocomposite structure where δ-NbN nanocrystals were embedded in SiN x amorphous matrix.Films deposited at U B ¼0 V were highly (001)-textured. Application of substrate bias potential led to a depletion of light atoms, and caused a grain size refinement concomitantly with the increase of (111) preferred orientations in both films. The maximum hardness was 28 GPa and 32 GPa for NbN and Nb-Si-N films, respectively. NbN and Nb-Si-N films deposited at U B ¼ À70 V exhibited compressive stress of À 3 and À 4 GPa, respectively. After vacuum annealing, a decrease in the stress-free lattice parameter was observed for both films, and attributed to alteration of film composition. To obtain insights on interface properties and related mechanical and thermal stability of Nb-Si-N nanocomposite films, first principles molecular dynamics simulations of NbN/SiN x heterostructures with different structures (cubic and hexagonal) and atomic configurations were carried out. All the hexagonal heterostructures were found to be dynamically stable and weakly dependent on temperature. Calculation of the tensile strain-stress curves showed that the values of ideal tensile strength for the δ-NbN(111)-and ε-NbN(001)-based heterostructures with coherent interfaces and Si 3 N 4 -like Si 2 N 3 interfaces were the highest with values in the range 36-65 GPa, but lower than corresponding values of bulk NbN compound. This suggests that hardness enhancement is likely due to inhibition of dislocation glide at the grain boundary rather than interfacial strengthening due to Si-N chemical bonding.

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Section: Introductionmentioning

confidence: 99%

Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Pogrebnjak

Бондар

Abadias

et al. 2016

Ceramics International

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“…While nitrides of single elements are studied well enough, their multilayer modifications need study that is more detailed [26][27][28][29][30][31][32][33][34][35]. Therefore, the study of features of structure, elemental and phase composition of multilayer coatings depending on the deposition conditions is an important task in solid-state physics and materials science [36][37][38][39][40][41][42][43][44][45][46][47][48][49][50][51].…”

Section: Introductionmentioning

confidence: 99%

Arc-Evaporated Nanoscale Multilayer Nitride-Based Coatings for Protection Against Wear, Corrosion, and Oxidation

2016

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The studies of the structure and properties of nanoscale multilayer coatings based on the nitrides of refractory metals are summarized in a brief review. By the example of TiN/MoN, TiN/ZrN, CrN/MoN, and more complex (multilayer) (TiZrNbTaHf)N/WN:(TiZrNbTaHf)N/MoN obtained by vacuum-arc deposition of cathode, the dependences of their hardness, wear resistance, friction, corrosion, and oxidation on conditions of the deposition and layers' thickness are investigated and analysed. The regularities of the structure and behaviour properties of such nanoscale multilayer coatings depending on the size of nanograins, textures, and stresses arising in these coatings are described.У короткому огляді узагальнено результати досліджень структури та влас-тивостей наномасштабних багатошарових покриттів нітридів тяжкотоп-ких металів. На прикладі TiN/MoN-, TiN/ZrN-, CrN/MoN-та більш склад-них (багатошарових) (TiZrNbTaHf)N/WN:(TiZrNbTaHf)N/MoN-покриттів, одержаних методою вакуумно-дугового осадження катоду, досліджено та проаналізовано залежності їх твердости, зносостійкости, тертя, корозії й окиснення від умов осадження та товщини шарів. Відмічено закономірнос-ті структури та властивостей поведінки даних наномасштабних багатоша-рових покриттів від розміру нанозерен, текстури та напруг, що виникають у цих покриттях.В кратком обзоре обобщены результаты исследований структуры и свойств наномасштабных многослойных покрытий нитридов тугоплавких метал-лов. На примере TiN/MoN-, TiN/ZrN-, CrN/MoN-и более сложных (много-

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“…A varying the deposition conditions, such as gas pressure in the deposition chamber, bias potential, bilayer thickness, etc. allows to fabricate coatings with very high hardness [9][10][11], good wear coefficient and resistance to wear, oxidation [12][13][14][15][16][17] and to corrosion [18,19] as well as with good electrical properties [20,21]. As it was reported in the previous papers [22,23], coatings on the (Ti,Zr)N base have high hardness 42-48 GPa, as well as resistance to oxidation under the influence of high temperatures 1170°С [24][25][26][27][28].…”

Section: Introductionmentioning

confidence: 75%

Multilayered vacuum-arc nanocomposite TiN/ZrN coatings before and after annealing: Structure, properties, first-principles calculations

Pogrebnjak

Иващенко

Бондар

et al. 2017

Materials Characterization

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A B S T R A C TNanoscale multilayered TiN/ZrN films were deposited using sequential vacuum-arc deposition of Ti and Zr targets in a nitrogen atmosphere. Studies of film's properties were carried out using various modern methods of analysis, such as XRD, STEM, HRTEM, SIMS combined with results of nanoindentation and tribological tests. To interpret the mechanical properties of the deposited multilayer films first-principles calculations of TiN(111), ZrN(111) structures and TiN(111)/ZrN(111) multilayer were carried out. To study the influence of thermal annealing, several samples were annealed in air at the temperature 700°C. All deposited samples were highly polycrystalline with quite large 20-25 nm crystals. The crystalline planes were very ordinated and demonstrated an excellent coordinated growth. The nanohardness and elastic modulus of non-annealed coatings reached 42 GPa and 348 GPa, respectively. Annealing in air at the temperature 700°C led to partial oxidation of the multilayered coatings, however hardness of the non-oxidized part of the coatings remained as high, as for initial coatings. All deposited coatings demonstrate good wear resistance.

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Structure and mechanical properties of δ-NbN/SiNx and δ′-NbN/SiNx nano-multilayer films deposited by reactive magnetron sputtering

Cited by 28 publications

References 34 publications

Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Arc-Evaporated Nanoscale Multilayer Nitride-Based Coatings for Protection Against Wear, Corrosion, and Oxidation

Multilayered vacuum-arc nanocomposite TiN/ZrN coatings before and after annealing: Structure, properties, first-principles calculations

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