2000
DOI: 10.1016/s0169-4332(00)00398-6
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Structure and magnetic properties of electrodeposited Co films onto Si(100)

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Cited by 39 publications
(27 citation statements)
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“…The coercive field range is rather large: the smallest value (below 30 Oe) being indicative of the nearly bulk behaviour of Co due to the discontinuous Cu layer whereas the largest value (over 230 Oe) being due to a very thin continuous Co layer. The recent results of Cerisier et al [26] for electrodeposited Co films support well our above findings. Namely, these authors have reported a linear decrease of H c from 192 to 25 Oe as the thickness of a Co layer electrodeposited on (1 1 1) textured polycrystalline Cu was varied from 2.5 to 100 nm.…”
Section: Dependence Of Mr and Coercivity On Co Layer Thicknesssupporting
confidence: 92%
See 1 more Smart Citation
“…The coercive field range is rather large: the smallest value (below 30 Oe) being indicative of the nearly bulk behaviour of Co due to the discontinuous Cu layer whereas the largest value (over 230 Oe) being due to a very thin continuous Co layer. The recent results of Cerisier et al [26] for electrodeposited Co films support well our above findings. Namely, these authors have reported a linear decrease of H c from 192 to 25 Oe as the thickness of a Co layer electrodeposited on (1 1 1) textured polycrystalline Cu was varied from 2.5 to 100 nm.…”
Section: Dependence Of Mr and Coercivity On Co Layer Thicknesssupporting
confidence: 92%
“…(b) Evolution of the coercive field H c and MR peak position H p of electrodeposited Co(Cu)/Cu multilayers with magnetic layer thickness for both thin and thick non-magnetic layers. The triangle (W) indicates the coercive field of a single Co thin film electrodeposited on Cu[26].…”
mentioning
confidence: 99%
“…At this pH, the formation of the hexagonal structure of Co is favored [20]. The measured open circuit potential (OCP) of the Co(II) solution investigated was À250F10 mV in dark.…”
Section: Resultsmentioning
confidence: 96%
“…However, reports on the electrochemical deposition of magnetic metals and alloys onto Si are relatively scarce [18][19][20][21][22]. In a recent communication, we have reported the ED of magnetic nuclei of Co-Ni alloys onto n-Si (100) [23].…”
Section: Introductionmentioning
confidence: 99%
“…Munford et al [13] have demonstrated the feasibility of electrodeposition of high-quality continuous Co films on n-type Si(100), and different groups have already reported their electrochemical conditions for the deposition of these metal films on silicon substrates [14][15][16][17]. Even nanosized Co structures on n-and p-type Si(111) [18][19][20] were obtained without evidence of oxide formation, interdiffusion, or solid-state reactivity.…”
Section: Introductionmentioning
confidence: 99%