“…Munford et al [13] have demonstrated the feasibility of electrodeposition of high-quality continuous Co films on n-type Si(100), and different groups have already reported their electrochemical conditions for the deposition of these metal films on silicon substrates [14][15][16][17]. Even nanosized Co structures on n-and p-type Si(111) [18][19][20] were obtained without evidence of oxide formation, interdiffusion, or solid-state reactivity.…”