Structure and its thickness dependence of thin films of phenyl and methyl silsesquioxane polymers

Linear/Ladder-Like Polysiloxane Block Copolymers with Methyl-, Trifluoropropyl- and Phenyl- Siloxane Units for Surface Modification

“…The polyhedral oligomeric silsesquioxanes (POSS) with their rigid high thermostable structures present another structural motive for the variation of architecture of block-copolymers [ 6 ]. The major usage of such polymers is in coating/thin film applications [ 7 ]. The advantage of POSS in relation to the random crosslinked linear polysiloxanes is that they remain processable by dissolution or softening/melting.…”

Isoniazid‐sensing Behavior of a Hybrid Silsesquioxane and Cobalt Pentacyanonitrosylferrate‐based Nanocomposite

“…The advantage of using hybrid silsesquioxane-derived materials and nanocomposites is the development of new materials, due to their excellent thermal and mechanical aspects, low dielectric constant, well-defined inorganic framework at the nanosized scale level [8,9] and suitable properties for specific applications. In this context, silsesquioxanes can be applied in diverse technological areas, such as additives [10], glass and ceramic matrices precursors [11,12], dendrimer precursors [13][14][15][16], polymers [17,18], fluorescent polymeric materials [19,20]; liquid crystal precursors [21,22], organic-inorganic hybrid material precursors [23][24][25][26], silica interface precursors [27,28], in electroactive films [29]; as adsorbents [30][31][32], homogeneous and heterogeneous catalysts [33,34] and antibacterials and biocides [35]. They are also applied in thin films and coatings, aiming at several applications, including nanocomposites [36][37][38].…”