2005
DOI: 10.1016/j.susc.2004.11.039
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Structure and growth of ultrathin titanium oxide films on Ru(0001)

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Cited by 39 publications
(49 citation statements)
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“…The clean Ru(0001) substrate was first oxidized in 5 × 10 −8 mbar of O 2 at 373 K for 6 min, which resulted in a (2 × 1)O/Ru(0001) structure 43,44 with an oxygen coverage of 0.5 ML. The oxygen ad-layer was used primarily to prevent intermixing of Si and Ru, as well as to facilitate the oxidation of Si ad-atoms.…”
Section: Resultsmentioning
confidence: 99%
“…The clean Ru(0001) substrate was first oxidized in 5 × 10 −8 mbar of O 2 at 373 K for 6 min, which resulted in a (2 × 1)O/Ru(0001) structure 43,44 with an oxygen coverage of 0.5 ML. The oxygen ad-layer was used primarily to prevent intermixing of Si and Ru, as well as to facilitate the oxidation of Si ad-atoms.…”
Section: Resultsmentioning
confidence: 99%
“…Films have the invaluable advantage that they can be prepared in a very clean and electrically conductive fashion and, in addition, be grown by epitaxy in a certain desired crystallographic orientation forced by the lattice parameters of the host surface. In the recent literature there are some detailed reports on the growth and structure of thin titanium dioxide films grown on Ni, Pt, Mo, W, Ru and Re surfaces, [16,17,41,[63][64][65][66][67][68][69][70][71][72][73][74] which we consider in somewhat more detail below. Surface-analytical methods employed were, among others, LEED, Auger electron spectroscopy (AES), ion scattering, X-ray photoelectron spectroscopy (XPS), STM, surface X-ray diffraction and photoemission.…”
Section: (110) Oriented Rutile Thin Filmsmentioning
confidence: 99%
“…Titanium Dioxide on Ruthenium, Ru(0001): The (hcp) ruthenium (0001) surface has been chosen as a substrate for titania deposition, too. [73,74] In an early work, Badyal et al [73] used LEED, AES, XPS and CO adsorption/titration to characterise the Ru(0001)-TiO x interface with the motivation to model and quantify the SMSI phenomenon. [36,37] The TiO x films were prepared by controlled evaporation of Ti in an ambient atmosphere (p = 1 10 À6 Torr O 2 ); excessive oxygen chemisorbed on the Ti-free patches of the Ru(0001) surface could be removed by appropriate hydrogen exposure and off-reaction.…”
Section: (110) Oriented Rutile Thin Filmsmentioning
confidence: 99%
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“…Single crystals and thin films: RhO 2 /Rh(111) [8], VO x /Rh(111) [18], FeO/Pt(111) [6], FeO/Ru(0001) [19], TiO 2 /Ru(0001) [20], FeO/Rh(111) [21]; Al 2 O 3 /Ni 3 Al [7] In these examples the superstructure periodicity ranges from 1.4 nm to 4.5 nm. The future expansion of this list will give us the freedom of tailoring the nanoblocks in size and the array spacing.…”
Section: Model and Discussionmentioning
confidence: 99%