Structure and gas separation properties of ultra-smooth PE-CVD silicon organic coated composite membranes

Kleines, Lara; Wilski, Stefan; Alizadeh, Philipp; Rubner, Jens; Weßling, Matthias; Hopmann, Christian; Dahlmann, Rainer

doi:10.1016/j.surfcoat.2021.127338

Cited by 11 publications

(24 citation statements)

References 30 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…It allows the fabrication of tailored coatings with regard to mechanical and chemical properties and, at the same time, enables low coating thicknesses in the nanometer range. The formation of organosilica layers by PECVD utilizing hexamethyldisiloxane (HMDSO) as a precursor results in membranes with gas separation characteristics [ 15 , 16 , 17 , 18 , 19 , 20 , 21 , 22 , 23 ]. Inorganic [ 24 , 25 , 26 , 27 ] or organic substrate membranes [ 15 , 21 , 22 , 23 , 28 , 29 , 30 , 31 , 32 , 33 ] function as support for the thin organosilica layer.…”

Section: Introductionmentioning

confidence: 99%

“…The formation of organosilica layers by PECVD utilizing hexamethyldisiloxane (HMDSO) as a precursor results in membranes with gas separation characteristics [ 15 , 16 , 17 , 18 , 19 , 20 , 21 , 22 , 23 ]. Inorganic [ 24 , 25 , 26 , 27 ] or organic substrate membranes [ 15 , 21 , 22 , 23 , 28 , 29 , 30 , 31 , 32 , 33 ] function as support for the thin organosilica layer. Besides, PECVD enables the combination of advantages of different membrane materials.…”

Section: Introductionmentioning

confidence: 99%

“…Furthermore, PECVD is already industrially used and scalable in roll-to-roll processes and therefore can be easily applied for industrial scale membrane production [ 34 ]. Since the resulting selective layer properties are dependent on the plasma parameters [ 22 , 23 ], membranes for different separation tasks can be fabricated on the same production line by only changing the plasma parameters. While PECVD membranes are not a new concept in the literature of the last two decades, research does not offer much information on mixed gas experiments with such membranes.…”

Section: Introductionmentioning

confidence: 99%

“…The solid line in Figure 1 represents the Robeson upper bound [ 4 ]. The filled circles show the permeation characteristics of our composite membranes with selective PECVD coatings fabricated with varying coating parameters (refer to Kleines et al [ 21 , 22 ]). Additionally, the characteristics of the used PDMS substrate for the PECVD coating and two commercially available polymers (Matrimid [ 36 ] and P84 [ 37 ]) are plotted as reference.…”

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD)

et al. 2022

View full text Add to dashboard Cite

Selective, nanometer-thin organosilica layers created by plasma-enhanced chemical vapor deposition (PECVD) exhibit selective gas permeation behavior. Despite their promising pure gas performance, published data with regard to mixed gas behavior are still severely lacking. This study endeavors to close this gap by investigating the pure and mixed gas behavior depending on temperatures from 0 °C to 60 °C for four gases (helium, methane, carbon dioxide, and nitrogen) and water vapor. For the two permanent gases, helium and methane, the studied organosilica membrane shows a substantial increase in selectivity from αHe/CH4 = 9 at 0 °C to αHe/CH4 = 40 at 60 °C for pure as well as mixed gases with helium permeance of up to 300 GPU. In contrast, a condensable gas such as CO2 leads to a decrease in selectivity and an increase in permeance compared to its pure gas performance. When water vapor is present in the feed gas, the organosilica membrane shows even stronger deviations from pure gas behavior with a permeance loss of about 60 % accompanied by an increase in ideal selectivity αHe/CO2 from 8 to 13. All in all, the studied organosilica membrane shows very promising results for mixed gases. Especially for elevated temperatures, there is a high potential for separation by size exclusion.

show abstract

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD)

et al. 2022

View full text Add to dashboard Cite

show abstract

“…Multiple studies report the use of plasmapolymeric coatings in the field of gas separation membranes. [25][26][27][28][29][30][31] Coatings are typically deposited on inorganic [32][33][34][35] or on organic substrate membranes. [27,[36][37][38][39][40][41][42] Up to now, the influence of PECVD coatings on the aging behavior of the underlying polymer has not been studied.…”

mentioning

confidence: 99%

Organosilica coating layer prevents aging of a polymer with intrinsic microporosity

Rubner

Stellmann

Mertens

et al. 2022

Plasma Processes & Polymers

Self Cite

View full text Add to dashboard Cite

This study tracks the physical aging behavior of coated and uncoated ultra-thin poly(1-trimethylsilyl-1-propyne) (PTMSP) films on silicon wafers based on the refractive index using ellipsometry. The measured refractive index directly correlates with the free volume and hence the physical aging progression. Plasma-enhanced chemical vapor deposition (PECVD) creates coatings with different thicknesses and oxidation degrees onto PTMSP films. Compared to uncoated PTMSP films, the PECVD-coated films show a reduction of the refractive index increase of more than two orders of magnitude for less than 10 nm thin SiOx coatings. In contrast, SiOCH films show only a minor impact. The results reveal the superior physical aging behavior of PECVD-coated films compared to untreated PTMSP films.

show abstract

Advances in surface modification and functionalization for tailoring the characteristics of thin films and membranes via chemical vapor deposition techniques

Mostafavi

Mishra

Gallucci

et al. 2023

J of Applied Polymer Sci

View full text Add to dashboard Cite

Advanced materials are among the prime drivers for technological revolutions and transformation in quality of lives. Over time, several modification techniques have emerged enabling development of novel materials with extraordinary features. The present review aims to introduce various promising chemical and physical surface modification techniques instrumental for tailoring the characteristics of thin films and membranes. Meticulous discussions are provided over chemical vapor deposition (CVD) techniques evolved for addressing the demands for materials with desired functionalities. Also, essential criteria for the selection of substrates, modifying and precursor materials for an effective CVD modification are elaborated. Investigations are extended to unraveling the role of various process parameters on the quality and properties of deposition. Special attention is paid to the significance and performance of CVD‐based membranes and thin films for industrial applications ranging from desalination and water treatment to energy and environment, biomedical and life science as well as packaging. The goal has been to establish a scientific platform for a timely tracking of the prevailing trends in exploitation of CVD techniques and highlighting the unexplored opportunities. This also helps in identification of the scientific and technical gaps and setting directions for further progress in the fields of thin films and membranes.

show abstract

Structure and gas separation properties of ultra-smooth PE-CVD silicon organic coated composite membranes

Cited by 11 publications

References 30 publications

On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD)

On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Organosilica coating layer prevents aging of a polymer with intrinsic microporosity

Advances in surface modification and functionalization for tailoring the characteristics of thin films and membranes via chemical vapor deposition techniques

Contact Info

Product

Resources

About