Structural transformation and functional properties of vanadium oxide films after low-temperature annealing

Goltvyanskyi, Yu.; Khatsevych, I.; Kuchuk, Andrian; Kladko, V. P.; Melnik, V.; Lytvyn, P. M.; Nikirin, V.; Romanyuk, B. N.

doi:10.1016/j.tsf.2014.05.067

Cited by 20 publications

(5 citation statements)

References 34 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The W profile in Figure b shows that the content of W in different depths in the film retain an average value of 1.70% in the near-surface region and is in accordance with purpose doping contents. The average ratio of O/V is 1.801 in the film with the V middle layer of the sputtering time 3 s. According to the report of Goltvyanskyi et al on the phase components of the VO x (1.8 < x < 2.2), the single-phase-ordered VO 2 phase with a high TCR value, low hysteresis parameters, and resistivity at room temperature can be easily formed, displaying a high thermochromic effect and sensitivity to infrared radiation …”

Section: Results and Discussionmentioning

confidence: 96%

“…The average ratio of O/V is 1.801 in the film with the V middle layer of the sputtering time 3 s. According to the report of Goltvyanskyi et al on the phase components of the VO x (1.8 < x < 2.2), the single-phase-ordered VO 2 phase with a high TCR value, low hysteresis parameters, and resistivity at room temperature can be easily formed, displaying a high thermochromic effect and sensitivity to infrared radiation. 28 3.2. Optical and Electrical Properties.…”

Section: Resultsmentioning

confidence: 99%

See 1 more Smart Citation

Sputtering Deposition of Sandwich-Structured V₂O₅/Metal (V, W)/V₂O₅ Multilayers for the Preparation of High-Performance Thermally Sensitive VO₂ Thin Films with Selectivity of VO₂ (B) and VO₂ (M) Polymorph

Heng-wu

Wan

Ahmad

et al. 2016

ACS Appl. Mater. Interfaces

View full text Add to dashboard Cite

For specific application to an uncooled infrared detector, VO2 thin films should have a series of characteristics including purposefully chosen polymorphs, accurate stoichiometry, phase stabilization, a high temperature-coefficient of resistance (TCR), and suitable square-resistance. This work reports controllable preparation of high-performance VO2 films via post annealing of a sandwich-structured V2O5/metal (V, W)/V2O5 multilayer precursor, which was deposited by RF magnetron sputtering. This sandwich structure can dynamically regulate oxygen contents and doping element levels in the films, enabling us to achieve accurate regulation of stoichiometry and polymorphs. The precursor films undergo a B to M phase transition depending on the quantity of the metal layers. At the thickness of the metal layer below a limitation, the resulting film after heat treatment was VO2 (B), and above the limitation, the product was VO2 (M). The optical modulation of the VO2 (M) in the near-infrared region can be tuned from 1.2 to 39.8% (ΔT2000 nm). TCR values can range from -1.89 to -4.29%/K and the square-resistances at room temperature (R0) from 69.68 to 12.63 kΩ. The simplicity in phase regulation of the present method and the superior optical and electrical properties of the films may allow its wide applications in thermo-opto-electro sensing devices.

show abstract

Section: Results and Discussionmentioning

confidence: 96%

Section: Resultsmentioning

confidence: 99%

Sputtering Deposition of Sandwich-Structured V₂O₅/Metal (V, W)/V₂O₅ Multilayers for the Preparation of High-Performance Thermally Sensitive VO₂ Thin Films with Selectivity of VO₂ (B) and VO₂ (M) Polymorph

Heng-wu

Wan

Ahmad

et al. 2016

ACS Appl. Mater. Interfaces

View full text Add to dashboard Cite

show abstract

“…3 a Tauc plot is a beneficial correlation in bandgap between VO 2 synthesized here and reported pristine VO 2 structures. The spectrum indicates that the crystals in solution are VO 2 , since the determined bandgap between V 3d 8 and 3p* of B0.72 eV is characteristic for pristine VO 2 , [56][57][58][59][60][61][62] while other possible vanadium oxides such as V 2 O 5 feature wider gaps of B2.35 eV. 62,63 These measurements confirm that there are no other vanadium oxides present since the bandgap measures is characteristic to VO 2 .…”

Section: Composition Optical Bandgap Raman Spectra and Surface Morphology Of Vo 2 Crystalsmentioning

confidence: 75%

Room-temperature application of VO₂ microstructures on rigid and flexible substrates based on synthesis of crystalline VO₂ solution

et al. 2020

View full text Add to dashboard Cite

show abstract

“…Transitions in structure and composition have been reported for VO x films as function of atmosphere and annealing temperature [19].…”

Section: Discussionmentioning

confidence: 99%

Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)

et al. 2017

View full text Add to dashboard Cite

Vanadium oxide films amorphous, nonstoichiometric and highly absorbing in the optical region were deposited on ITO-coated glass and on silicon substrates, by the hot-filament metal oxide deposition technique (HFMOD) and oxidized by ex-situ annealing in a furnace at 200, 300, 400 and 500 ºC, under an atmosphere of argon and rarefied oxygen. X-ray diffraction, Raman and Rutherford backscattering spectroscopy as well as optical transmission were employed to characterize the amorphous and annealed films. When annealed at 200 and 300 ºC the as-deposited opaque films become transparent but still amorphous. Under treatments at 400 and 500 ºC a crystalline nonstoichiometric V 2 O 5 structure is formed. All the annealed films became semiconducting, with their optical absorption coefficients changing with the annealing temperature. An optical gap of 2.25 eV was measured for the films annealed at 400 and 500 ºC. The annealing in rarefied oxygen atmosphere proved to be a useful and simple ex-situ method to modulate the structural and optical properties of vanadium oxide films deposited by HFMOD technique. This technique could be applied to other amorphous and non-absorbing oxide films, replacing the conventional and sometimes expensive method of modulate desirable film properties by controlling the film deposition parameters. Even more, the HFMOD technique can be an inexpensive alternative to deposit metal oxide films.

show abstract

Structural transformation and functional properties of vanadium oxide films after low-temperature annealing

Cited by 20 publications

References 34 publications

Sputtering Deposition of Sandwich-Structured V₂O₅/Metal (V, W)/V₂O₅ Multilayers for the Preparation of High-Performance Thermally Sensitive VO₂ Thin Films with Selectivity of VO₂ (B) and VO₂ (M) Polymorph

Sputtering Deposition of Sandwich-Structured V₂O₅/Metal (V, W)/V₂O₅ Multilayers for the Preparation of High-Performance Thermally Sensitive VO₂ Thin Films with Selectivity of VO₂ (B) and VO₂ (M) Polymorph

Room-temperature application of VO₂ microstructures on rigid and flexible substrates based on synthesis of crystalline VO₂ solution

Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)

Contact Info

Product

Resources

About

Structural transformation and functional properties of vanadium oxide films after low-temperature annealing

Cited by 20 publications

References 34 publications

Sputtering Deposition of Sandwich-Structured V2O5/Metal (V, W)/V2O5 Multilayers for the Preparation of High-Performance Thermally Sensitive VO2 Thin Films with Selectivity of VO2 (B) and VO2 (M) Polymorph

Sputtering Deposition of Sandwich-Structured V2O5/Metal (V, W)/V2O5 Multilayers for the Preparation of High-Performance Thermally Sensitive VO2 Thin Films with Selectivity of VO2 (B) and VO2 (M) Polymorph

Room-temperature application of VO2 microstructures on rigid and flexible substrates based on synthesis of crystalline VO2 solution

Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)

Contact Info

Product

Resources

About

Sputtering Deposition of Sandwich-Structured V₂O₅/Metal (V, W)/V₂O₅ Multilayers for the Preparation of High-Performance Thermally Sensitive VO₂ Thin Films with Selectivity of VO₂ (B) and VO₂ (M) Polymorph

Sputtering Deposition of Sandwich-Structured V₂O₅/Metal (V, W)/V₂O₅ Multilayers for the Preparation of High-Performance Thermally Sensitive VO₂ Thin Films with Selectivity of VO₂ (B) and VO₂ (M) Polymorph

Room-temperature application of VO₂ microstructures on rigid and flexible substrates based on synthesis of crystalline VO₂ solution