1998
DOI: 10.1088/0953-2048/11/3/005
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Structural strain ina-axis oriented thin films studied by electron backscatter diffraction

Abstract: The electron backscatter diffraction technique has been used to study the depth distribution of the structural strain in a-axis oriented films made by a self-template method. It has been found that the structural strain was mainly formed in the upper layer near the interface between the template and upper layer. In contrast, there is little strain in the template layer. The strain can be relaxed when the thickness of the upper layer exceeds a certain value. The results agree with the observation of a dramati… Show more

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Cited by 1 publication
(4 citation statements)
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“…The data in table 1 show that tendency of T c is increasing with the upper layer thickness. In [13], a dramatic improvement in the transition temperature and metallic behaviour was also observed when the upper layer was thicker than about 200 nm. Furthermore, the relatively short a-axis lattice parameter in the upper layer suggests that the strain is of tension in nature in the upper films.…”
Section: Resultsmentioning
confidence: 90%
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“…The data in table 1 show that tendency of T c is increasing with the upper layer thickness. In [13], a dramatic improvement in the transition temperature and metallic behaviour was also observed when the upper layer was thicker than about 200 nm. Furthermore, the relatively short a-axis lattice parameter in the upper layer suggests that the strain is of tension in nature in the upper films.…”
Section: Resultsmentioning
confidence: 90%
“…Such an intermediate layer appears to consist of c-axis-oriented structures. Gao and Chen [13] suggested that the intermediate layer could be due to the growth dynamics rather than interaction.…”
Section: Resultsmentioning
confidence: 99%
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