2019
DOI: 10.1116/1.5082185
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Structural properties of strained epitaxial La1+δCrO3 thin films

Abstract: HAL is a multidisciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers. L'archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d'enseignement et de recherche français ou étrangers, des labora… Show more

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Cited by 3 publications
(6 citation statements)
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“…The fluxes were measured before the growth using a Bayard-Alpert (BA) gauge (after subtraction of the background pressure) and checked using a quartz crystal microbalance ( Fig. S1) 25 . The stoichiometry has been calibrated using flux measurements by BA gauge and quartz crystal microbalance (QCM), X-ray diffraction (XRD) on calibration series (LCO and SrCrO3), Rutherford backscattering spectrometry (RBS) and X-ray photoelectron spectroscopy (XPS) (see Fig.…”
Section: Introductionmentioning
confidence: 99%
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“…The fluxes were measured before the growth using a Bayard-Alpert (BA) gauge (after subtraction of the background pressure) and checked using a quartz crystal microbalance ( Fig. S1) 25 . The stoichiometry has been calibrated using flux measurements by BA gauge and quartz crystal microbalance (QCM), X-ray diffraction (XRD) on calibration series (LCO and SrCrO3), Rutherford backscattering spectrometry (RBS) and X-ray photoelectron spectroscopy (XPS) (see Fig.…”
Section: Introductionmentioning
confidence: 99%
“…After deposition, the substrate temperature was lowered to 200°C at a rate of 50 °C/min while the background O2 was pumping out. All the films were grown on as-received substrates, except that grown on STO, for which the substrate was treated to be terminated by a TiO2 plane 25,26 . Reflection high-energy electron diffraction (RHEED) was used to check in-situ the qualitative structural quality of the films.…”
Section: Introductionmentioning
confidence: 99%
“…The fluxes were calibrated using a Bayard-Alpert Gauge and checked with a quartz microbalance in UHV (Fig. S1) 27,56 . The substrates were annealed under the growth conditions for 15 minutes to remove surface impurities before starting the growth at 750 °C and P(O2) = 1×10 -7 Torr, and at a growth rate of 0.15 nm per minute.…”
Section: Methodsmentioning
confidence: 99%
“…The samples shown here were also used for another study published elsewhere, 27 and were grown successively in the same period and the same growth conditions after proper calibration. 27,56 The films were grown by solid-source oxide molecular beam epitaxy (MBE) in an ultrahigh vacuum (UHV) chamber with a base pressure of less than 1 × 10 −9 Torr. Sr, La, and Cr were evaporated from effusion cells in co-deposition.…”
Section: Methodsmentioning
confidence: 99%
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