2020
DOI: 10.1016/j.mssp.2020.105190
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Structural, optical and photoresponse characteristics of metal-insulator-semiconductor (MIS) type Au/Ni/CeO2/GaN Schottky barrier ultraviolet photodetector

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Cited by 29 publications
(13 citation statements)
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“…At present, there are only a few studies focusing on the use of rare-earth oxides in the field of detectors. For example, Nallabala et al 13 prepared MIS-type Au/Ni/CeO 2 /GaN UV photodetectors via metal−organic chemical vapor deposition (MOCVD). The corresponding article was the first report dealing with the effect of the CeO 2 rare-earth interface oxide layer on the performance of Au/Ni/CeO 2 /GaN MIS Schottky diode UV detectors, which had slow response speeds exhibited by the rise and decay times of 2.73 and 5.35 s, respectively.…”
Section: Introductionmentioning
confidence: 99%
“…At present, there are only a few studies focusing on the use of rare-earth oxides in the field of detectors. For example, Nallabala et al 13 prepared MIS-type Au/Ni/CeO 2 /GaN UV photodetectors via metal−organic chemical vapor deposition (MOCVD). The corresponding article was the first report dealing with the effect of the CeO 2 rare-earth interface oxide layer on the performance of Au/Ni/CeO 2 /GaN MIS Schottky diode UV detectors, which had slow response speeds exhibited by the rise and decay times of 2.73 and 5.35 s, respectively.…”
Section: Introductionmentioning
confidence: 99%
“…[ 1 , 2 , 3 ]. Many semiconductor materials, including GaN, TiO 2 , diamond, SiC and ZnO, have been developed and used in UV photodetectors [ 4 , 5 , 6 ]. Among them, ZnO semiconductor materials have attracted much attention due to their wide band gap, excellent chemical and thermal stability and specific electrical and optical properties with a large excitation binding energy (60 meV) [ 7 ].…”
Section: Introductionmentioning
confidence: 99%
“…Due to its direct-wide band gap (3.4eV) and high thermal conductivity [3,4], thermal stability, high melting point [5], high electron mobility [6], mechanical hardness, and high breakdown voltage [7], the material gallium nitride (GaN) has become more attractive in recent years. Due to these properties, thin lm has become one of the essential materials of industrial devices.…”
Section: Introductionmentioning
confidence: 99%
“…Because of its extremely broad band gap (3.4 eV) and high heat conductivity, it's a popular semiconductor [4][5][6], high value of melting point, high value of thermal stability [7], high value of the mobility of the electron [8,9], high value of the mechanical hardness, and finallty a high voltage of the breakdown [10], In recent years, the material gallium nitride (GaN) has become more appealing [11,12]. As a result of these characteristics, thin film has become one of the most essential materials in devices manufacturing.…”
Section: Introductionmentioning
confidence: 99%