2014
DOI: 10.1063/1.4891225
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Structural, optical, and electrical properties of strained La-doped SrTiO3 films

Abstract: The structural, optical, and room-temperature electrical properties of strained La-doped SrTiO3 epitaxial thin films are investigated. Conductive La-doped SrTiO3 thin films with concentration varying from 5 to 25% are grown by molecular beam epitaxy on four different substrates: LaAlO3, (LaAlO3)0.3(Sr2AlTaO6)0.7, SrTiO3, and DyScO3, which result in lattice mismatch strain ranging from −2.9% to +1.1%. We compare the effect of La concentration and strain on the structural and optical properties, and measure thei… Show more

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Cited by 56 publications
(59 citation statements)
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“…The experimental details are given in Ref. [19]. Keeping states up to four p-h pairs almost reproduces the exact spectrum.…”
Section: Rheed Datamentioning
confidence: 87%
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“…The experimental details are given in Ref. [19]. Keeping states up to four p-h pairs almost reproduces the exact spectrum.…”
Section: Rheed Datamentioning
confidence: 87%
“…First, the Ti 3+ peak position is dopant independent and is an intrinsic property of the Ti atom, or more precisely the TiO 6 cluster. Indeed, in lightly n-doped SrTiO 3 , the Ti 3+ peaks all appear in the same position relative to the Ti 4+ peak [17][18][19] (Fig. 5) [47]), demonstrate the XPS spectra showing multiple components.…”
Section: Comments On Experimentsmentioning
confidence: 99%
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“…More details of the experimental system can be found elsewhere. 35,36 All substrates were outgassed in the MBE chamber at 700 for 30 min under ultra-high vacuum (UHV) prior to alumina deposition. The substrate temperature was measured by a thermocouple (calibrated by pyrometer measurement of a silicon substrate) in close proximity to the substrate heater.…”
Section: Methodsmentioning
confidence: 99%
“…More details of the experimental system can be found elsewhere. [87,161] All substrates were outgassed in the MBE chamber at 700° for 30 min under ultra-high vacuum (UHV). The substrate temperature was measured by a thermocouple (calibrated by pyrometer measurement of a silicon substrate) in close proximity to the substrate heater.…”
Section: Methodsmentioning
confidence: 99%