Herein,
we report the plasma effect on the surface defects of GaN
nanowires (NWs). A gradient plasma growth system by microwave plasma
chemical vapor deposition is demonstrated for NWs growth. The structure
and surface defects of NWs are affected by the plasma distribution.
The PL results show that emission peaks at ∼355, ∼374,
and ∼389 nm arising from near band edge emission are observed
from the GaN NWs under different plasma growth environment. The relative
emission area (E
relative) of the specific
emission peaks to total emission area (E
total) from the different growth regions also changes. The reason for
variant ratio E
relative
/E
total is related to the surface defects including structural
defects and oxygen incorporation according to the results of high-resolution
transmission electron microscopy and X-ray photoelectron spectroscopy.
The analysis of PL properties provided a strong evidence for formation
of distinct surface defects. The emission mechanism of GaN NWs grown
in a high-density plasma environment enriches our understanding of
the plasma effects on the surface defects and optical property, and
the knowledge is important to the development of nano-optoelectronic
devices.