2020
DOI: 10.1021/acs.jpcc.0c00438
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Structural Modulation of GaN Nanowires Grown in High-Density Plasma Environment

Abstract: We demonstrate a structural modulation method of GaN nanowires (NWs) by microwave plasma chemical vapor deposition. This method is based on the self-assembled growth mode without a harmful gas source and could easily achieve structures with a remarkable range of geometries and sizes by regulating the plasma-phase conditions. The results show that we are able to modulate GaN NWs with a large scale of sizes of lengths from ∼2.2 to 52.4 μm and diameters from ∼22 to 1000 nm. Due to introduce the high-density plasm… Show more

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Cited by 4 publications
(8 citation statements)
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“…According to the VLS mechanism, the growth rate is given by the Givargizov–Chernov (GC) model neglecting the diffusion effects: where b is the kinetic coefficient of crystallization independent of supersaturation, k is Boltzmann’s constant, T is the growth temperature, Δμ represents supersaturation of nanoscale GaN, Δ μ 0 is supersaturation of bulk GaN, α is the specific free energy of the NW surface, and Ω is the molecular volume of GaN NW. By analyzing the relationship between ν 1/2 and 1/ d as shown in Figure j, the growth state of NWs in RG-2 and 3 is affected by the high-density plasma environment consistent with our previous study . The plasma content thus has a significant effect on NW growth and the Ga-rich environment is more conducive to the growth of high-quality GaN NWs.…”
Section: Resultssupporting
confidence: 85%
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“…According to the VLS mechanism, the growth rate is given by the Givargizov–Chernov (GC) model neglecting the diffusion effects: where b is the kinetic coefficient of crystallization independent of supersaturation, k is Boltzmann’s constant, T is the growth temperature, Δμ represents supersaturation of nanoscale GaN, Δ μ 0 is supersaturation of bulk GaN, α is the specific free energy of the NW surface, and Ω is the molecular volume of GaN NW. By analyzing the relationship between ν 1/2 and 1/ d as shown in Figure j, the growth state of NWs in RG-2 and 3 is affected by the high-density plasma environment consistent with our previous study . The plasma content thus has a significant effect on NW growth and the Ga-rich environment is more conducive to the growth of high-quality GaN NWs.…”
Section: Resultssupporting
confidence: 85%
“…By analyzing the relationship between ν 1/2 and 1/d as shown in Figure 2j, the growth state of NWs in RG-2 and 3 is affected by the high-density plasma environment consistent with our previous study. 21 The plasma content thus has a significant effect on NW growth and the Ga-rich environment is more conducive to the growth of high-quality GaN NWs.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
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“…Figure a illustrates the preparation process diagram of the MoS 2 ‐GaN NWs memristor. The memristive layer in this two‐terminal device is fabricated on the silicon (Si) substrate by plasma enhanced chemical vapor deposition (PECVD) [ 21–23 ] and magnetron sputtering and to obtain a stable top electrode structure, spray coating is performed with the Ag NWs solution. The side‐ and top‐view SEM images of the MoS 2 ‐GaN NWs and pure GaN NWs are depicted in Figure 1b–e showing that MoS 2 is coated around the NWs.…”
Section: Resultsmentioning
confidence: 99%