2022
DOI: 10.1016/j.electacta.2021.139445
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Structural influence of nitrogen-containing groups on triphenylmethane-based levelers in super-conformal copper electroplating

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Cited by 27 publications
(10 citation statements)
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“…Meanwhile, a pattern reaction for the synthesis of levelers has not yet emerged. Design and synthesis of levelers are time-consuming, so the study of the structure–property of levelers is of great significance. ,, A previous study reported diketopyrrolopyrrole (DPP)-based levelers which have a fully conjugated, highly stable, and rigid planar structure . A DPP-based leveler with a four-ring-fused skeleton is an excellent substrate that could firmly anchor on the copper surface and optimize the deposition behavior.…”
Section: Introductionmentioning
confidence: 99%
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“…Meanwhile, a pattern reaction for the synthesis of levelers has not yet emerged. Design and synthesis of levelers are time-consuming, so the study of the structure–property of levelers is of great significance. ,, A previous study reported diketopyrrolopyrrole (DPP)-based levelers which have a fully conjugated, highly stable, and rigid planar structure . A DPP-based leveler with a four-ring-fused skeleton is an excellent substrate that could firmly anchor on the copper surface and optimize the deposition behavior.…”
Section: Introductionmentioning
confidence: 99%
“…8,9 Levelers are usually considered to be the most important additive due to the fact that they can selectively adsorb on the high current density area of the cathode surface (the mouth of the TH), while the low current density region (the center of the TH) is less affected. 8,10,11 As is well known, levelers in copper deposition are typically nitrogen-containing quaternary ammonium salts, quaternary ammonium surfactants, polymers, and inorganic anions. 12−14 Recently, our team have developed plenty of pigment-based quaternary ammonium salts, while theoretical calculations were used to evaluate these levelers, and launched chemical calculations that showed distinct leveling performance for uniform copper electrodeposition.…”
Section: Introductionmentioning
confidence: 99%
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“…15 suppressor, poly(ethylene glycol) (PEG) can not only increase cathodic polarization and suppress copper deposition but also reduce surface tension and improve wettability. 16 As for levelers, although several levelers have been proposed and developed, their performance cannot well meet the needs of copper superfilling. Therefore, it is highly necessary to develop new levelers.…”
Section: Introductionmentioning
confidence: 99%