2011
DOI: 10.1016/j.tsf.2010.12.139
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Structural, electrical and optical properties of carbon-doped CdS thin films prepared by pulsed-laser deposition

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Cited by 40 publications
(18 citation statements)
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“…, and the same order as occurred in X-doped bulk CdS [18]. The moderate formation energy suggests that C dopant can be easily implanted into CdS matrix in experiment [42]. Now, we turn to consider the local structures of doped CdS monolayer with one X impurity.…”
Section: Stabilities and Geometry Structures Of X-mentioning
confidence: 76%
See 1 more Smart Citation
“…, and the same order as occurred in X-doped bulk CdS [18]. The moderate formation energy suggests that C dopant can be easily implanted into CdS matrix in experiment [42]. Now, we turn to consider the local structures of doped CdS monolayer with one X impurity.…”
Section: Stabilities and Geometry Structures Of X-mentioning
confidence: 76%
“…For the B‐, C‐, and N‐doing, the formation energies follow the order: E f (B) > E f (N) > E f (C), and the same order as occurred in X‐doped bulk CdS . The moderate formation energy suggests that C dopant can be easily implanted into CdS matrix in experiment .…”
Section: Resultsmentioning
confidence: 99%
“…Various techniques and methods have been applied to deposit doped CdS films such as thermal evaporation, chemical vapor deposition spray pyrolysis (SP), Silar, pulsed laser deposition, sol‐gel, and sputtering . Among all the techniques, the SP technique is best suited for Cd 0.8 Sn 0.2 S thin film deposition because it enables a low production cost of large area thin films and good adherence with easy intentional doping .…”
Section: Introductionmentioning
confidence: 99%
“…Owing to their interesting structural, optical and electrical properties that are much different compared to bulk materials, CdS thin films can be applied in many technologies such as window layer in solar cells 2 , optical sensors 3 , transistors 4 , diodes 5 , etc. Various methods such as electrodeposition 6 , spray pyrolysis 7 , successive ionic layer adsorption and reaction (SILAR) 8 , pulsed-laser deposition 9 , vacuum evaporation 10 , chemical bath deposition (CBD) 11 , and thermal evaporation 12 , etc. are used to prepare CdS thin films.…”
Section: Introductionmentioning
confidence: 99%