Structural-elastic relationships of Zr-TL (TL = Cu, Co, Ni) thin films metallic glasses

Abstract

International audienceIn this study, we investigated the structural and elastic properties of Zr-TL (late transition metal TL = Cu, Co, Ni) thin films metallic glasses (TFMG) deposited by dc magnetron co-sputtering from pure TL targets in Ar plasma discharge. The influence of the deposition parameters on the microstructure, chemical composition and elastic properties of the thin films has been explored. Advanced non-destructive techniques such as the picosecond ultrasonics and the Brillouin light scattering were employed to selectively measure the longitudinal V L and the transversal V T sound velocities, leading to the determination of the elastic constants C 11 , C 44 , respectively. From these data sets, the elastic constants of metastable amorphous single elements a-Zr, a-Cu, a-Co and a-Ni have been extrapolated. Some relationships between elastic moduli (Young's modulus E and shear modulus G = C 44) and the structural state either crystalline or amorphous are established. Predicted ductility/brittleness character was emphasized based on the Blackman's diagram, Pugh's ratio and the Pettifor criteria. Equivalently, the newly introduced δ parameter termed as 'the cooperation parameter' and related uniquely to the Poisson's ratio ν, confirmed the improvement of ductility with TL alloying

Surface erosion in nc-ZrN/a-ZrCu multilayer films after He irradiation

“…1a displays the XRD patterns of as-deposited monolithic Zr1-xCux reference films with Cu content x = 0.45, 0.53, 0.61 and 0.74. For all films, the presence of a broad halo, characteristic of the first sharp diffraction peak (FSDP) in metallic glasses [26][27][28], is observed. This indicates the formation of amorphous films in the investigated compositional range.…”

Sensitive Five-Fold Local Symmetry to Kinetic Energy of Depositing Atoms in Cu-Zr Thin Film Growth

“…For example, Dudonis et al [14] performed electron bombardment of Cu and Zr targets at different powers to prepare different compositional Zr x Cu 100−x films (5 ≤ x ≤ 95) in a magnetron sputtering deposition. Apreutesei et al [15] prepared Zr-Cu MG films by DC magnetron sputtering in argon gas, and studied the influence of deposition parameters on structure and elastic properties. Daisman et al [16] used single-target magnetron sputtering method to prepare Zr-based MG thin films with higher stability.…”

Different Effects of Annealing on Microstructure Evolution and SERS Performance for Cu–Cr Alloy Film and Bulk Alloy

“…Apart from the obvious substrate (PI ) peaks, the deposited Cu–Cr alloy film possesses peaks in diffuse scattering and a low crystallinity Cu (111) diffraction peak without any Cr peaks, showing near–amorphous thin film. The alloy films (Cu(Zr)–M, M = Zr, Cr, Ni, Co) prepared by magnetron sputtering may be amorphous films with the short– and medium–range order microstructure [11,12]. In the initial stage of alloy film formation, the tendency to form amorphous thin film is higher than that of crystalline, which is mainly affected by activation energy and free energy during the nucleation process.…”