Structural Effect of Polymer and Inhibitor on Alkali Dissolution and Dissolution Inhibition Characteristics.

Abstract

The relationship between the higher structure of resist polymers, such as novolak (NVK) and poly(hydroxystyrene) (PHS), and their alkali dissolution and dissolution inhibition characteristics were investigated. From the calculations of the polymers with molecular mechanics (MM) and molecular dynamics (MD), NVK exhibited the structure with intramolecular hydrogen bondings through ortho-ortho methylene bonds, while PHS formed them through the OH group on ortho position, thereby both giving oriented structures with OH groups in the molecular interior. The alkali dissolution of the polymers having such higher structures showed lower values, and these tendency corresponded to the interpretation of percolation mechanism with respect to the alkali dissolution of polymers. In order to estimate the higher structures of the polymers, the n values in the Henderson-Hasselbach equation were measured. The increase in the n values resulted in the decrease in the alkali dissolution of the polymers. Furthermore, the structural factors of dissolution inhibitors on chemical amplification resist were also studied for their inhibition characteristics. The acid decomposition of inhibitors were stepwise proceeded resulting in that the dissolution inhibitors significantly lost their inhibition ability at a certain step in decomposition. With selective use of this step, the dissolution discrimination of the resist could be improved.

Applications of molecular modeling in nanolithography

“…1,5 The extent to which the results of such calculations can be carried over to condensed many-molecule systems is not known. 1,5 The extent to which the results of such calculations can be carried over to condensed many-molecule systems is not known.…”

Characterization and Lithographic Application of Calix[4]resorcinarene Derivatives

“…Small molecules that undergo acid-catalyzed deprotection to generate acidic compounds in an acidic or protected polymer matrix have been also employed as a dissolution inhibitor in the design of chemical amplification resists. – Furthermore, the use of small molecules that form amorphous glass (molecular glass), instead of polymers, has attracted a great deal of attention recently as a means to overcome the size-related issues (resolution and LER) in lithography below 30 nm. Polyphenolic compounds – (including calix[4]arenes – ), polyhedral oligomeric silsesquioxane, , cholates, , cyclodextrins, , adamantanes, dendrimers, and fullerenes have been reported as chemically amplified molecular glass resists.…”

A Computational Probe into the Dissolution Inhibitation Effect of Diazonaphthoquinone Photoactive Compounds on Positive Tone Photosensitive Polyimides

“…Hydrophobicity, molecular size, and dispersivity of DNQ PACs are reported to be the key factors to improve the dissolution inhibition of a photoresist. 55 For p-PSPI films, the dispersivity of DNQ PACs should have a crucial effect besides the H-bonding interactions. We therefore compared the dispersivity of DNQ PACs in the simulated films before and after UV exposure.…”