2018
DOI: 10.1016/j.tsf.2018.02.011
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Structural characterization of Zr-doped ZnO films deposited on quartz substrates by reactive radio frequency magnetron co-sputtering

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Cited by 11 publications
(5 citation statements)
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“…The effect of high temperature very much influence the particle morphology of the as equipped ZnO nanopowder and Nidoped ZnO nanoparticles in different molarities like 0.1, 0.2, and 0.3M. As the molarities concentration increases FWHM (Full Width Half Maximum) increases and at higher molarities concentration value FWHM (Full Width Half Maximum) decreases (14) . The calculated grain size of undoped and Ni-doped ZnO nanoparticles is tabulated in Table 1.…”
Section: Structural Studymentioning
confidence: 99%
“…The effect of high temperature very much influence the particle morphology of the as equipped ZnO nanopowder and Nidoped ZnO nanoparticles in different molarities like 0.1, 0.2, and 0.3M. As the molarities concentration increases FWHM (Full Width Half Maximum) increases and at higher molarities concentration value FWHM (Full Width Half Maximum) decreases (14) . The calculated grain size of undoped and Ni-doped ZnO nanoparticles is tabulated in Table 1.…”
Section: Structural Studymentioning
confidence: 99%
“…In another study, Madhi et al [12] examined the optical and electrical properties of calcium-doped ZnO thin films and found that the transmittance of ZnO: Ca films was above 80% and the lowest electrical resistivity was about (5.10 −3 Ω.cm) [13]. Sung et al [14], studied Zr doped ZnO thin films grown on quartz substrates by RF sputtering technique and investigated the effect of Zr doping on the optical properties of ZnO. It was found that the optical transparency of the thin films was above 90%, but the optical band gap of the Zr doped ZNO (ZZO) thin films increased with Zr addition.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, Zr 4+ (ionic radius of 0.742 Å) and Zn 2+ (ionic radius of 0.745 Å) ions have similar radii and Zr is an n-type doping impurity; thus, it can increase the carrier density in ZnO thin films. (24)(25)(26) Many methods, such as sputtering, pulsed laser deposition (PLD), and the sol-gel method, (27,28) can be used for depositing ZnO thin films. Sputtering is advantageous over the other methods for preparing uniform and large-area films with higher quality.…”
Section: Introductionmentioning
confidence: 99%
“…However, ZZO thin films have seldom been prepared by sputtering, with very little literature available. (26) The aim of this study was to prepare ZZO thin films by sputtering on Corning 1737 glass substrates, which was followed by annealing at different temperatures. We analyzed the effects of the annealing temperature on the structural, optical, and electrical properties of the films.…”
Section: Introductionmentioning
confidence: 99%